Metal mask plate preparation method

A metal mask and metal film technology, which is applied in the coating process of metal materials, the photoengraving process of the pattern surface, and the originals used for optical mechanical processing, etc., can solve the problems of large opening size and poor accuracy, and achieve The effect of improving accuracy

Inactive Publication Date: 2017-12-01
EVERDISPLAY OPTRONICS (SHANGHAI) CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Because this method adopts wet etching, its accuracy is relatively poor, and the opening size is relatively large, and the upper limit of the pixel density (pixels per inch, PPI) is also small (about 350), which are unwilling to be seen by those skilled in the art. Arrived

Method used

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  • Metal mask plate preparation method
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Embodiment Construction

[0018] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, but not as a limitation of the present invention.

[0019] Such as figure 2 As shown, this embodiment relates to a method for preparing a metal mask, preferably, the metal mask is a precision metal mask; specifically, the method includes the following steps:

[0020] In step S1, a substrate 100 is provided. In an embodiment of the present invention, the substrate 100 can be a flexible substrate or a rigid substrate (such as a glass substrate, etc.), as long as the material of the substrate 100 can facilitate subsequent formation of organic substrates. The film 101 can be peeled off from the substrate 100, such as Figure 3a structure shown.

[0021] Step S2, forming a layer of organic film 101 on the substrate 100, since the step of forming the organic film 101 on the substrate 100 is not the focus of the improvement of the present invention, ...

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Abstract

The present invention relates to the technical field of mask plate manufacturing, particularly to a metal mask plate preparation method. According to the present invention, a photoresist layer with a plurality of openings is formed on an organic film, and after a metal film is formed in the opening, the metal film is peeled off to form a mask plate, such that the precision of the mask plate and the upper limit of the PPI can be improved.

Description

technical field [0001] The invention relates to the technical field of mask manufacturing, in particular to a method for preparing a metal mask. Background technique [0002] With the development of display technology, consumers have higher and higher requirements for audio-visual products. For display manufacturers, the production of high-resolution and high-quality displays is the development direction, while Organic Light Emitting Diode (OLED) ) has been widely used in displays due to its characteristics of self-illumination, high brightness, wide viewing angle, fast response, and RGB full-color components can be produced. [0003] As a new generation of display, organic light-emitting display has better characteristics than LCD and other displays, such as self-illumination without backlight, flexible display, etc. It also has advantages in contrast and response time. There are several methods to realize OLED devices, and one of the more basic methods is the RGB pixel ju...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04H01L21/027G03F1/00
CPCC23C14/04G03F1/00H01L21/027
Inventor 王国兵
Owner EVERDISPLAY OPTRONICS (SHANGHAI) CO LTD
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