Polishing pad dresser and polishing pad dressing method
A technology for grinding pads and dressers, which is applied to grinding/polishing equipment, parts of grinding machine tools, abrasive surface adjustment devices, etc., can solve the problems of complex structure of grinding pad dressers and unsatisfactory dressing effects of grinding pads, and achieve Enhanced grinding results, easy implementation, ensure consistent results
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[0045] The inventors have studied the prior art and found that in most cases, the unstable dressing pressure of the dressing disc is the most important reason for the low material removal rate and poor flatness of the grinding pad. In order to solve the problem of unsatisfactory dressing effect of the polishing pad in the prior art, the present invention provides a polishing pad dresser and a polishing pad dressing method.
[0046] The invention provides a polishing pad dresser, which is used in the wafer manufacturing process to dress a polishing pad so that the surface of the polishing pad is flattened, which includes:
[0047] a dressing disc for dressing a grinding pad;
[0048] a fluid pressure driving unit, connected to the trimming disc, and used to drive the trimming disc to move through fluid power;
[0049] A control unit, connected to the fluid pressure driving unit, used to control the fluid pressure driving unit to drive the conditioning disc to press against the...
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