Surface layer cleaning device for silicon rod production

Abstract

The invention discloses a surface layer cleaning device for silicon rod production. The surface layer cleaning device comprises a device main body and a top cover. Dust particle adsorbers are embedded in the top of the device main body; a shell is fixed to the bottom of the device main body; the bottom of the shell is closely connected with fine broken filaments; a wiper is installed inside the shell, and air driers are installed on the two sides of the wiper; and rotating shafts are fixed to the right sides of the air driers. The surface layer cleaning device for silicon rod production adopts the advantages of other cleaning devices; the problem that the design of a cleaning device in the prior art is not reasonable enough is solved through the joint effect of the dust particle adsorbers and an elastic plate; the arranged dust particle adsorbers communicate with the outside space and can convey adsorbed dust particles to the outside of the cleaning device; and the dust particles adsorbed by the dust particle adsorbers can be conveyed to the outside of the cleaning device because of the small size of the cleaning device, so that the dust particles adsorbed by the dust particle adsorbers do not need to be removed regularly, and the cleaning effect can be further promoted.

Description

technical field [0001] The invention relates to the technical field of cleaning devices, in particular to a surface cleaning device for silicon rod production. Background technique [0002] Generally, silicon rods are used as important raw materials for semiconductor devices, solar cells, chemical processing equipment, industrial systems, or small-sized and other highly integrated precision devices, which are composed of materials with high purity or semiconductor properties, respectively. A large number of rods are used, and the production equipment is also varied, but the cleaning of the production equipment has always been a difficult problem. [0003] However, the design of the existing cleaning device is not very reasonable, the device is not connected to the outside, resulting in the inability to discharge the absorbed dust particles, causing the accumulation of dust particles in the device, and the dust particles adsorbed by the dust particle adsorber cannot be cleane...

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Problems solved by technology

[0003] However, the design of the existing cleaning device is not very reasonable, the device is not connected to the outside, resulting in the inability to discharge the absorbed dust particles, causing the accumulation of dust particles in the device, and the dust particles adsorbed by the dust particle adsorber cannot be cleaned regularly , affecting the cleaning work in the later stage. During the wiping process, the surface of the abutment cannot be fully contacted, so that the cleaning work is not comprehensive enough

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