Anti-allergic restoring facial mask

A technology of facial mask and extract, which is applied in the field of skin care products, can solve the problems of complex preparation process, many kinds of raw materials, and difficulty in realization, and achieve the effect of simple preparation method, relief of redness and pain, and enhancement of skin resistance

Inactive Publication Date: 2017-12-22
HEFEI KADIER COSMETIC CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Most of the anti-allergic products on the market now only have the effects of soothing and relieving itching. The raw materials are many and complex, and t

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment example 1

[0039]Formula: anti-allergic repair mask, in terms of mass percentage, water: 84.1%, dipropylene glycol: 2%, glycerin: 6%, methylpropanediol: 1%, mushroom dextran: 0.5%, Semenja: 5% , Olive Fruit Extract: 0.5%, Milk Skin Conditioner: 0.1%, Allantoin: 0.3%, Sodium Hyaluronate: 0.005%, Bio-Gum-1: 0.2%, PEG-40 Hydrogenated Castor Oil: 0.01% , disodium EDTA: 0.03%, GPL preservatives: 0.1%, methylparaben: 0.15% and fragrance: 0.005%.

[0040] Preparation: (1) heating and dissolving methylparaben with a small amount of methyl propylene glycol to obtain prefabricated raw material A; (2) uniformly dispersing sodium hyaluronate with a small amount of methyl propylene glycol to obtain prefabricated raw material B; (3) PEG-40 hydrogenated castor oil and essence Mix and stir evenly to obtain prefabricated raw material C; (4) Add water into the stirring pot and heat to about 80°C, then add disodium EDTA, allantoin, bio-glucose gum-1, prefabricated raw material A and prefabricated raw mater...

Embodiment example 2

[0042] Formula: anti-allergic repairing mask, in terms of mass percentage, water: 83.037%, dipropylene glycol: 3%, glycerin: 5%, methyl propylene glycol: 2%, mushroom dextran: 0.8%, Somatan: 4% , Olive Fruit Extract: 1%, Milk Skin Conditioner: 0.2%, Allantoin: 0.25%, Sodium Hyaluronate: 0.08%, Biosugar Gum-1: 0.3%, PEG-40 Hydrogenated Castor Oil: 0.015% , disodium EDTA: 0.04%, GPL preservatives: 0.15%, methylparaben: 0.12% and fragrance: 0.008%.

[0043] Preparation: (1) heating and dissolving methylparaben with a small amount of methyl propylene glycol to obtain prefabricated raw material A; (2) uniformly dispersing sodium hyaluronate with a small amount of methyl propylene glycol to obtain prefabricated raw material B; (3) PEG-40 hydrogenated castor oil and essence Mix and stir evenly to obtain prefabricated raw material C; (4) add water to the stirring pot and heat to about 83°C, add disodium EDTA, allantoin, bio-glucose gum-1, prefabricated raw material A and prefabricated...

Embodiment example 3

[0045] Formula: anti-allergic repairing mask, in terms of mass percentage, water: 82.21%, dipropylene glycol: 4%, glycerin: 4%, methyl propylene glycol: 3%, mushroom dextran: 1%, Semenja: 3% , Olive Fruit Extract: 1.5%, Milk Skin Conditioner: 0.3%, Allantoin: 0.2%, Sodium Hyaluronate: 0.01%, Bio-Gum-1: 0.4%, PEG-40 Hydrogenated Castor Oil: 0.02% , disodium EDTA: 0.05%, GPL preservatives: 0.2%, methylparaben: 0.1% and fragrance: 0.01%.

[0046] Preparation: (1) heating and dissolving methylparaben with a small amount of methyl propylene glycol to obtain prefabricated raw material A; (2) uniformly dispersing sodium hyaluronate with a small amount of methyl propylene glycol to obtain prefabricated raw material B; (3) PEG-40 hydrogenated castor oil and essence Mix and stir evenly to obtain prefabricated raw material C; (4) Add water into the stirring pot and heat to about 85°C, add disodium EDTA, allantoin, bio-glucose gum-1, prefabricated raw material A and prefabricated raw mate...

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PUM

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Abstract

The invention discloses an anti-allergic restoring facial mask which comprises the following components: water, dipropylene glycol, glycerin, methyl propanediol, SC-glucan, Shuminjia, an olea europaea fruit extract, a milk skin conditioner, allantoin, sodium hyaluronate, biosaccharide gum-1, PEG-40 hydrogenated castor oil, disodium EDTA, a GPL preservative, methylparaben and essences. The raw materials used in the invention have mild nature, no irritation, no toxic and side effects, and significant effects of relieving sensitivity, diminishing inflammation and sterilizing, astringing and restoring skin, activating skin cells, enhancing skin resistance and restoring physiological functions of the skin, can rapidly relieve swelling and pain caused by skin allergy, astringe and restore sensitive and damaged cells, deeply penetrate the skin, continuously replenish nutrients and moisture of the skin, lock water and keep moisture for long term, play a nourishing role while supplementing water, and achieve a long-term skin beautifying effect.

Description

technical field [0001] The invention relates to the technical field of skin care products, in particular to an anti-allergy repair mask. Background technique [0002] With the acceleration of people's life rhythm, the increase of work pressure and the change of diet structure, the allergic population is increasing rapidly. According to incomplete statistics, allergic patients have accounted for two-fifths of the world's population. Globally, more and more people feel allergic skin. Skin allergy has become a social problem that affects human health, and it is also the subject of research by scholars. Hot Issues. [0003] At present, the development of natural anti-allergic additives mostly uses a single anti-inflammatory approach to achieve anti-allergic effects. Although it can improve skin sensitivity problems to a certain extent, it cannot meet consumer expectations from the perspective of "skin health" and comprehensively improve skin sensitivity. Skin care appeal. [...

Claims

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Application Information

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IPC IPC(8): A61K8/9794A61K8/9789A61K8/73A61K8/34A61K8/98A61K8/49A61Q19/00A61Q17/00A61P29/00A61P37/08
CPCA61K8/97A61K8/345A61K8/4946A61K8/73A61K8/735A61K8/986A61K2800/5922A61K2800/72A61Q17/005A61Q19/00A61Q19/005
Inventor 吴成亮
Owner HEFEI KADIER COSMETIC CO LTD
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