Etching solution for nano silver conductive film and preparation method for patterned nano silver conductive film
A technology of nano-silver and conductive film, applied in the field of preparation of transparent conductive film, to achieve the effect of consistent optical properties, basic optical properties, and small shape differences
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Embodiment 1
[0026] Embodiment 1: The etching solution includes 10 parts of propylenediamine, 70 parts of deionized water, 10 parts of ethylene glycol, and 10 parts of surfactant. Among them, propylenediamine is an etchant, deionized water is used as a solvent, and ethylene glycol has a moisturizing effect, which can reduce the volatility of the etching solution.
[0027] The preparation method of the etching solution is as follows: stirring and uniformly dispersing propylenediamine, deionized water, ethylene glycol and a surfactant under normal temperature and pressure to obtain the etching solution with etching function.
Embodiment 2
[0028] Embodiment 2: The etching solution includes 5 parts of sodium sulfide, 80 parts of deionized water, 5 parts of pH regulator, sodium sulfide as etchant, and deionized water as solvent.
[0029] The preparation method of the etching solution is as follows: stirring and uniformly dispersing sodium sulfide, deionized water, and a pH regulator under normal temperature and pressure to obtain an etching solution having an etching function.
Embodiment 3
[0030] Embodiment 3: The etching solution includes 10 parts of thiocyanate, 80 parts of deionized water, and 10 parts of ethylene glycol. Among them, thiocyanate is used as an etchant, deionized water is used as a solvent, and ethylene glycol has a moisturizing effect and can reduce the volatility of the etching solution.
[0031] The preparation method of the etching solution is as follows: under normal temperature and pressure, thiocyanate, deionized water, ethylene glycol and surfactant are stirred and dispersed evenly to obtain the etching solution with etching function.
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