Etching solution for nano-silver conductive film and method for preparing patterned nano-silver conductive film

Abstract

The invention provides an etching solution for a nano silver conductive film. The etching solution comprises 1-30 parts of an etchant, 70-90 parts of a solvent and 0-10 parts of an additive, wherein the etchant is the etchant which has no direct oxidation to silver at normal temperature and can be complexed with silver ions, so that the etching solution just cuts off a conductive network of an etching region instead of etching away a larger area of nano silver, the conductive function of the nano silver conductive film in the etching region disappears while etching marks are reduced, the morphology difference between the etching region and the non-etching region is small, and therefore the optical properties are basically the same.

Description

technical field [0001] The invention relates to a preparation method of a transparent conductive film, in particular to an etching solution used for a nano-silver conductive film and a preparation method of a patterned nano-silver conductive film. Background technique [0002] Nano-silver transparent conductive film has flexible characteristics, so it has a wide range of applications in flexible displays, touch sensors, solar cells, wearable devices and other fields. In the above applications, it is necessary to pattern the nano-silver conductive film. The commonly used processes include: laser etching, screen printing etching paste, etc. [0003] The above-mentioned laser etching process is a commonly used process. After printing silver paste, a laser laser machine is used to prepare functional patterns; however, laser etching equipment is expensive and inefficient, and the operation is limited by the size of the laser machine, and can only be used to prepare single-sided c...

AI Technical Summary

Problems solved by technology

These two processes can only operate on a single sheet, and cannot achieve roll-to-roll operations like the Huangguang process