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Illumination system of projection exposure equipment for microlithography

A lighting system and microlithography technology, applied in the field of lighting systems, can solve the problems of increasing the complexity and cost of the complete system

Active Publication Date: 2019-12-24
CARL ZEISS SMT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0013] While an additional digital mirror array provides excellent flexibility in producing field-dependent illumination settings, it also adds substantially to overall system complexity and cost, and thus warrants additional Digital Mirror Array

Method used

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  • Illumination system of projection exposure equipment for microlithography
  • Illumination system of projection exposure equipment for microlithography
  • Illumination system of projection exposure equipment for microlithography

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Experimental program
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Embodiment Construction

[0064] I. Conventional Construction of Projection Exposure Equipment

[0065] figure 1 is a perspective and highly simplified view of a projection exposure apparatus 10 according to the invention. The device 10 includes an illumination system 12 which generates a projected light beam. The latter illuminates a field 14 on a mask 16 containing a pattern 18 of fine features 19 . In this embodiment, the illuminated field 14 has a rectangular shape. However, other shapes of the illumination field 14, for example ring segments, are also conceivable.

[0066] The projection objective 20 has an optical axis OA and comprises a plurality of lenses 21 , imaging the pattern 18 within the illuminated field 14 onto a photosensitive layer 22 , such as photoresist, which is supported by a substrate 24 . A substrate 24 , which may be formed by a silicon wafer, is arranged on a wafer stage (not shown) such that the top surface of the photosensitive layer 22 lies precisely within the image p...

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Abstract

The illumination system of the microlithography projection exposure equipment includes first and second grating plates (54a). The radiation distribution of the projected light on the first and second grating plates determines the angular light distribution of the projected light only at the first part (60a) and the second part of the illumination field respectively. The second part is distinct from and arranged adjacent to the first part. This makes it possible to produce different lighting settings in different adjacent portions (60a, 60b) on the mask (14). The first and second Fourier optical systems (58a, 58b) establish the Fourier relationship between the first and second grating plates on the one hand and the first and second parts on the other hand. The first and second Fourier optical systems (58a) have first and second focal lengths respectively, and the first and second focal lengths are changeable in response to a focus change instruction signal from the control unit (45).

Description

technical field [0001] The present invention generally relates to illumination systems of projection exposure apparatuses for microlithography, and more particularly to illumination systems in which a fly-eye lens or other type of grating element is used to uniformly illuminate a mask. Background technique [0002] Microlithography (also known as photolithography or simply photolithography) is a technique used to manufacture integrated circuits, liquid crystal displays, and other microstructured devices. A microlithography process combined with an etch process to pattern features in a thin film stack that has been formed on a substrate (such as a silicon wafer). At various layers of fabrication, the wafer is first coated with photoresist, a material that is sensitive to specific wavelengths of light. Next, the wafer with photoresist on top is exposed to projected light through a mask in a projection exposure apparatus. The mask contains the circuit pattern to be imaged ont...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70075G03F7/70116G03F7/702G03F7/70208G03F7/70191
Inventor M.德冈瑟
Owner CARL ZEISS SMT GMBH
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