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Waste discharging system of plurality of photoresist spin-coating units

A waste box and waste liquid technology, which is applied to the surface coating liquid device, coating, photoplate making process coating equipment, etc., can solve the problems of liquid leakage, waste liquid pipeline blockage, liquid accumulation, etc. To achieve the effect of ensuring the smooth flow of the pipeline and preventing the emission of waste liquid odor

Active Publication Date: 2018-01-19
SHENYANG KINGSEMI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to solve the problem of liquid accumulation and leakage caused by the condensation of waste liquid or poor pipeline, the purpose of the present invention is to provide a waste discharge system with multiple glue leveling units

Method used

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  • Waste discharging system of plurality of photoresist spin-coating units
  • Waste discharging system of plurality of photoresist spin-coating units
  • Waste discharging system of plurality of photoresist spin-coating units

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Embodiment Construction

[0017] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0018] Such as Figure 1~3 As shown, the present invention includes a main body mounting plate 10 and a glue leveling unit 1, a liquid collection box 3, a waste discharge box 4, an air control diaphragm pump 6, a glue leveling unit 1, a collection cup 2, The liquid collection box 3, the waste discharge box 4 and the air-controlled diaphragm pump 6 form a diversion inner cavity that prevents the waste liquid from splashing and discharges the waste liquid from the glue uniform unit 1 in time; Distributed on the main body mounting plate 10, each glue leveling unit 1 is arranged in a process chamber; each glue leveling unit 1 is equipped with a collection cup 2, and the glue leveling unit 1 is the main power mechanism of the glue leveling process. The formed waste liquid is discharged from the waste discharge port of the back spray, the waste discharge port of t...

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PUM

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Abstract

The invention belongs to the field of waste discharging of a coating and photoresist process, and particularly relates to a waste discharging system of a plurality of photoresist spin-coating units. The plurality of photoresist spin-coating units are uniformly arranged on a main body installation plate, a collection cup is arranged outside each photoresist spin-coating unit, a liquid collection box is arranged at one side of each photoresist spin-coating unit, a back spraying waste discharging hole and an edge removal waste discharging hole of each photoresist spin-coating unit and a waste discharging hole of each collection cup are hermetically connected with the liquid collection box, one end of the liquid collection box communicates with a cleaning liquid supplied by an equipment factory service hole in a concentrated way via a cleaning pipeline, a pneumatic liquid valve is arranged on the cleaning pipeline and is used for controlling on / off of the cleaning pipeline, the other end of the liquid collection box communicates with the waste discharging box, a liquid sensor is arranged on the waste discharging box and is used for monitoring a liquid level of a waste liquid in a wastedischarging box in real time, an outlet of the waste discharging box is connected with an air control separator pump, and the waste liquid in the waste discharging box is discharged by the air control separator pump after the liquid level sensor is triggered. By the waste discharging system, waste liquid can be prevented from splashing and is timely discharged, and the waste liquid deposited in the waste discharging box can be effectively cleaned.

Description

technical field [0001] The invention belongs to the field of waste discharge in gluing and photoresist processes, in particular to a waste discharge system of multiple gluing units. Background technique [0002] At present, when the TRACK (coating and developing machine) machine and the lithography machine are running on-line in the market, there is a problem of insufficient TRACK production capacity, which greatly reduces the efficiency of the lithography process. In order to meet the requirements of production capacity, the design of TRACK unit considers the layout of multiple units in one equipment cavity, and optimizes the layout of the machine by means of centralized liquid supply, waste discharge and air exhaust; and whether a unit module adopts centralized waste discharge or each Spin (glue homogenizing unit) is bound to have the problem of poor drainage and liquid accumulation due to the long horizontal flow distance and the condensation of residual glue in the waste...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/16B05C11/10
Inventor 高晓旭
Owner SHENYANG KINGSEMI CO LTD