Method and system for generating double-exponential Bessel Gaussian beam
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- SUZHOU UNIV
- Publication Date
- 2018-01-23
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Abstract
Description
technical field
[0001] The invention relates to a method and system for generating double-exponential Bessel Gaussian beams. Background technique
[0002] Since Durnin proposed and experimentally generated Bessel beams, a great deal of work has been devoted to studying this particular beam because of its two main properties, non-diffraction and self-healing. These characteristics make Bessel beams have important applications in particle acceleration, medical imaging, material detection, optical micromanipulation, optical trapping and other fields. Since the ideal Bessel beam has an infinite radial direction and carries infinite energy, the ideal Bessel beam cannot be produced in physics, so only approximate Bessel beams can be produced in the experiment. These approximate Bessel beams can have the main characteristics of Bessel beams in a fairly long propagation distance, and Bessel Gaussian beams are one of them, and they are also very easy to produce experimentally. Expe...