mo/si/sio 2 Preparation method of solar selective absorbing coating
An absorption coating and selective technology, applied in the field of solar energy utilization, can solve the problems of expensive coating production equipment, attenuation of absorption performance, attenuation of coating performance, etc., to improve absorption and conversion efficiency, improve high temperature stability, increase light the effect of absorption
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Embodiment 1
[0042] (1) The surface of the Cu substrate is polished and degreased with acetone, cleaned with deionized water and dried in an oven for later use; before spraying, the surface of the substrate is sandblasted to achieve uniform roughness of the substrate surface Purpose.
[0043] (2) Prepare spherical agglomerate powder by spray granulation process: Take 10kg of composite powder as an example, Mo usage is 5kg, Si usage is 1kg, SiO 2 The dosage is 4kg; mix all raw materials and use water as a dispersant to make a stable liquid slurry; send the slurry to the prilling tower, and set the liquid material feeding rate to 500g·min -1 , the rotation speed of the atomizing disc is set to 10000r·min -1 , the air inlet temperature is set to 150°C, and the air outlet is set to 60°C. After the granulation is completed, the agglomerated powder of 60-80μm is screened for use;
[0044] (3) Take the above powder and use APS-3000 plasma spraying equipment to prepare a layer of 20-30μm Mo / Si / S...
Embodiment 2
[0051] (1) The surface of the Cu substrate is polished and degreased with acetone, cleaned with deionized water and dried in an oven for later use; before spraying, the surface of the substrate is sandblasted to achieve uniform roughness of the substrate surface Purpose.
[0052] (2) Prepare spherical agglomerate powder by spray granulation process: Take 10kg of composite powder as an example, Mo usage is 4kg, Si usage is 1kg, SiO 2 The dosage is 5kg; mix all raw materials and use water as a dispersant to make a stable liquid slurry; send the slurry to the prilling tower, and set the feeding rate of the liquid material to 500g·min -1 , the rotation speed of the atomizing disc is set to 10000r·min -1 , the air inlet temperature is set to 150°C, and the air outlet is set to 60°C. After the granulation is completed, the agglomerated powder of 60-80μm is screened for use;
[0053](3) Take the above powder and use APS-3000 plasma spraying equipment to prepare a layer of 20-30μm M...
Embodiment 3
[0059] (1) The surface of the Cu substrate is polished and degreased with acetone, cleaned with deionized water and dried in an oven for later use; before spraying, the surface of the substrate is sandblasted to achieve uniform roughness of the substrate surface Purpose.
[0060] (2) Prepare spherical agglomerate powder by spray granulation process: Take 10kg of composite powder as an example, the amount of Mo used is 3kg, the amount of Si used is 1kg, SiO 2 The usage amount is 6kg; mix all the raw materials and use water as the dispersant to make a stable liquid slurry; send the slurry to the prilling tower, and set the feeding rate of the liquid material to 500g·min -1 , the rotation speed of the atomizing disc is set to 10000r·min -1 , the air inlet temperature is set to 150°C, and the air outlet is set to 60°C. After the granulation is completed, the agglomerated powder of 60-80μm is screened for use;
[0061] (3) Take the above powder and use APS-3000 plasma spraying eq...
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