Heating chamber and semiconductor processing device
A technology for heating chambers and chambers, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc. It can solve problems such as product yield decline, large difference in gas flow rate, and poor process uniformity, so as to improve uniformity, gas flow rate, etc. The flow rate and flow rate are consistent, and the effect of improving product yield
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[0014] In order for those skilled in the art to better understand the technical solution of the present invention, the heating chamber and semiconductor processing equipment provided by the present invention will be described in detail below with reference to the accompanying drawings.
[0015] figure 1 A cross-sectional view of a heating chamber provided for an embodiment of the present invention. figure 2 for figure 1 Zoom-in view of the middle I region. Please also refer to figure 1 and figure 2 , the heating chamber 1 includes a susceptor 5 for carrying a wafer, and an air inlet mechanism for delivering process gas into the heating chamber 1 . Wherein, the intake mechanism includes a primary uniform flow chamber 2 and a secondary uniform flow chamber 3, wherein the secondary uniform flow chamber 3 is arranged above the base 5, and is evenly distributed on the bottom wall 32 of the secondary uniform flow chamber 3. A plurality of gas outlets 321 are distributed for d...
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