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Laser scan sequencing and orientation relative to airflow

A technology of scanning direction and airflow direction, applied in the field of laser scanning direction control, to achieve the effect of large circuit density, low standard deviation, and improved position accuracy performance

Active Publication Date: 2021-09-07
ELECTRO SCI IND INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Many of these hybrid laser and wafer edge processes are developed; however, the track width remains relatively large

Method used

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  • Laser scan sequencing and orientation relative to airflow
  • Laser scan sequencing and orientation relative to airflow
  • Laser scan sequencing and orientation relative to airflow

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Embodiment Construction

[0086] The technical means adopted by the present invention to achieve the intended invention purpose are further described below in conjunction with the drawings and preferred embodiments of the present invention.

[0087] Exemplary embodiments are described below with reference to the accompanying drawings. Many different forms and embodiments are possible without departing from the spirit and teachings of the disclosure, and thus the disclosure should not be considered limited to the exemplary embodiments set forth herein. Rather, these exemplary embodiments are provided so that this disclosure will be thorough and complete, and will convey the scope of this disclosure to those skilled in the art. In the drawings, the size and relative sizes of components may be out of scale and / or exaggerated for clarity. The terminology used herein is for the purpose of describing particular exemplary embodiments only and is not intended to be limiting. As used herein, the singular form...

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Abstract

Using a laser scanning direction (20) that is oblique relative to and counter to the main air flow direction (25) balances the quality and moire characteristics of the orthogonal scribe lines (26) made by laser scanning. The positioning and sequence of multiple pass scans used to form features wider than the width of the scribe line (26) can be controlled to enhance the quality and moire characteristics of the edges of the features.

Description

[0001] Cross-reference to related applications [0002] This application is a non-provisional application of US Provisional Patent Application No. 62 / 210,193 filed August 26, 2015, the contents of which are hereby incorporated by reference in their entirety for all purposes. [0003] Copyright Notice [0004] 2016Electro Scientific Industries, Inc. Portions of the disclosure of this patent document contain copyrighted material. The copyright owner has no objection to the facsimile reproduction by anyone of this patent document or the patent disclosure, as it appears in the Patent and Trademark Office patent file or records, but otherwise reserves all copyright rights. 37 CFR §1.71(d). technical field [0005] This application relates to systems and methods for laser scanning, and more particularly to systems and methods for laser scanning direction control relative to direction of airflow or relative to scan sequencing. Background technique [0006] Most semiconductor an...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/88G01N1/22G01N11/02
CPCB23K26/142B23K26/361B23K26/382B23K26/53B23K2103/56G01N1/22G01N11/02G01N21/8851G01N2201/1087
Inventor 达瑞·芬恩罗伯特·A·佛葛森
Owner ELECTRO SCI IND INC