Binary filter and manufacturing method thereof

Abstract

The invention discloses a binary filter, which includes a substrate, and a plurality of first filter units and a plurality of second filter units arrayed on two opposite surfaces of the substrate; wherein, the plurality of first The projections of the filter unit and the plurality of second filter units on the first surface or the second surface are in a cross distribution. The binary optical filter according to the present invention has the characteristics of different filtering functions, and can be combined with a micro-optical detection system, so as to be applied in the fields of medical diagnosis, atmosphere, space, ocean and the like. The present invention also discloses a manufacturing method of the above-mentioned binary filter, which includes: selecting a substrate; preparing a plurality of first filter units forming an array distribution and a plurality of second filter units forming an array distribution on two opposite surfaces of the substrate; Two filter units; wherein, the projections of the multiple first filter units and the multiple second filter units on the first surface or the second surface are mutually intersecting. According to the manufacturing method of the present invention, the process is simple and the integration degree is high.

Description

technical field [0001] The invention belongs to the technical field of optical filters, and in particular relates to a binary filter and a manufacturing method thereof. Background technique [0002] In order to adapt to the miniaturization of optoelectronic instruments, thin-film optical filters are also developing in the direction of smaller size and higher integration, and the preparation technology is becoming more and more challenging. At present, in the production of integrated optical filters, semiconductor micro-nano processing technology is mostly used, and the first optical filter film is patterned on the surface of the substrate by photolithography or etching technology, and then the second optical filter film is prepared, and repeated In the above patterning step, array patterns with different light filtering functions are arranged on the same surface. [0003] In the above method, the performance of the first filter film will be adversely affected during the pat...

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Problems solved by technology

[0003] The above method will adversely affect the performance of the first filter film in the process of patterning the second filter film

refer to Figure 1-Figure 2 , when the photolithographic lift-off process is used to prepare the integrated optical filter, after the patterning of the first optical filter film 210 on the substrate 100 is completed, the first optical filter film 210 needs to be covered with photoresist 300 to play a protective role, and then Preparation of the second filter film 220, the second filter film 220 will be in a high temperature state for a long time during the preparation process, and accompanied by ion beam bombardment, resulting in denaturation of the photoresist 300, which is difficult to remove, so that There is residual glue 300a on the surface of the first filter film 210 (such as figure 2 ), thereby causing the performance of the first filter film 210 to decline, reducing the yield of the entire integrated filter sample

or refer to Figure 3-Figure 5 , when the integrated optical filter is prepared by etching process, after the patterning of the first optical filter film 210 on the substrate 100 is completed, the second optical filter film 220 is directly prepared, so it is difficult to precisely control the The second filter film 220 is etched clean, which is easy to cause over-etching (such as Figure 4 ) or not completely etched (such as Figure 5 ) problem, causing the first filter film 210 to be thinned or leaving part of the second filter film 220 on the surface of the first filter film 210, which will also cause the performance of the first filter film 210 to decline

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