Scanning probe-elliptical polarization multifunctional coupling in-situ measurement device

Abstract

The invention discloses a scanning probe-elliptical polarization multifunctional coupling in-situ measurement device comprising an XY micro-motion scanner, a scanning probe microscopic measurement mechanism and an elliptical polarization light measurement mechanism. An under measurement sample support, a Z-axis piezoelectric micro-motion scanner and the XY micro-motion scanner and an XYZ coarse motion scanner are connected in series along an Z axis and rigidly connected with the scanning probe measurement mechanism on a pedestal. The tip of the scanning probe is on the interaction point of theincident light and the reflected light of the elliptical polarization light measurement mechanism, and the YZ plane formed by the scanning probe and the Z-axis is perpendicular to the XZ plane on which the incident light and the reflected light of the elliptical polarization light measurement mechanism are located. The beneficial effects of the device are that macro optical thickness and micro geometric information of the work sample can be measured in an in-situ, synchronous and real-time way, and operation is convenient, test is accurate and vivid and the measurement characterization efficiency is high.

Description

technical field [0001] The invention relates to the technical field of in-situ testing of macroscopic properties and microstructures of thin film materials, in particular to a scanning probe microscopic measurement-ellipsometry multifunctional coupling detection device for in-situ detection. Background technique [0002] As an important branch of advanced manufacturing technology, the research on thin film materials, the characterization and detection methods of the characteristic parameters of thin film materials are the key foundations. Scanning Probe Microscope (SPM) is an analytical method for measuring the microstructure and properties of a material surface. This microscopic method has a series of advantages such as high resolution, low cost, low consumption, and wide working range; it can obtain three-dimensional topography of the surface of high-resolution objects; it can perform continuous dynamic analysis; the disadvantage is that it can only perform microscopic loc...

AI Technical Summary

Problems solved by technology

With the complexity of the device structure, the unknown quantities that need to be measured continue to increase, which makes the traditional ellipsometer show certain limitations in the film thickness measurement and morphology characteristics of thin films.

[0003] In recent years, with the continuous development of thin film materials, pure atomic force microscopy and ellipsometry can no longer meet the needs of in-situ, microscopic and macroscopic, multi-functional coupling simultaneous measurement

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