Preparation method of cathode isolation retaining wall, display panel and preparation method of display panel
A technology of display panel and partition wall, applied in the field of photolithography process, can solve the problems of poor cathode patterning effect, inability to separate multiple cathode strips, etc.
Active Publication Date: 2018-04-13
BOE TECH GRP CO LTD
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Problems solved by technology
[0003] Among them, during the preparation process of the organic light-emitting diode array panel, it is necessary to prepare an anode layer, a cathode strip, and a cathode isolation wall for isolating two adjacent cathode strips on the substrate. In the prior art, a photolithography process is usually used The positive photoresist is exposed and developed to form a figure 1 The cross-section shown is a positive trapezoidal cathode isolation wall, but when the cathode layer is evaporated, the cathode layer formed on the anode layer and the cathode isolation wall will form an integral structure and cannot be separated into multiple cathode strips, so It will lead to the problem of poor cathode patterning effect
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[0032] In order to further explain the technical means and effects of the present invention to achieve the intended purpose of the invention, the specific implementation, structure and characteristics of the preparation method of the cathode isolation retaining wall proposed according to the present invention will be described below in conjunction with the accompanying drawings and preferred embodiments. And its effect, detailed description is as follows.
[0033] Such as figure 2 As shown, the embodiment of the present invention provides a method for preparing a cathode isolation retaining wall, including:
[0034] Step 101, such as image 3 As shown, the first photoresist layer 1 formed on the anode layer 4 is exposed to obtain the first isolation wall part 11; in the exposure process, the mercury arc lamp or other radiation sources can be irradiated on the On the first photoresist layer 1, wherein the mask plate has a light-transmitting area and a light-shielding area wi...
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Abstract
The invention discloses a preparation method of a cathode isolation retaining wall, a display panel and a preparation method of the display panel and relates to the technical field of photolithographyprocesses. The preparation method of the cathode isolation retaining wall is used for separating a cathode layer part evaporated on the cathode isolation retaining wall from another cathode layer part evaporated on an anode layer and improving the cathode patterning effect. The preparation method of the cathode isolation retaining wall comprises the steps of firstly exposing a first photoresist layer formed on the anode layer to obtain a first isolation retaining wall part; secondly, forming a second photoresist layer at one side, far away from the anode layer, of the first photoresist layer,exposing the second photoresist layer and then obtaining a second isolation retaining wall part which is laminated with at least one part of the first isolation retaining wall part; and finally developing the first photoresist layer and the second photoresist layer to obtain the cathode isolation retaining wall formed by the first isolation retaining wall part and the second isolation retaining wall part. The preparation method of the cathode isolation retaining wall is mainly used for preparing the cathode isolation retaining wall.
Description
technical field [0001] The invention relates to the technical field of photolithography technology, in particular to a preparation method of a cathode isolation retaining wall, a display panel and a preparation method thereof. Background technique [0002] At present, in the manufacturing process of display panels, an array process is generally used to form a patterned array on a sinking substrate to obtain a display panel. There are many types of these display panels, such as thin film transistor array panels and organic light emitting diode array panels. [0003] Among them, during the preparation process of the organic light-emitting diode array panel, it is necessary to prepare an anode layer, a cathode strip, and a cathode isolation wall for isolating two adjacent cathode strips on the substrate. In the prior art, a photolithography process is usually used The positive photoresist is exposed and developed to form a figure 1 The cross-section shown is a positive trapezo...
Claims
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Login to View More IPC IPC(8): H01L21/762H01L27/32
CPCH01L21/762H10K59/8052G06F3/0443H10K59/40H10K59/173H10K59/122G06F3/0412H10K50/82H10K50/8445H10K71/00
Inventor 王治杨盛际卢鹏程
Owner BOE TECH GRP CO LTD