Silicon wafer wet-etching device

Abstract

The invention discloses a silicon wafer wet-etching device capable of automatically adding chemical reagents in a wet-etching process. The silicon wafer wet-etching device comprises a water storage tank, an HF storage tank and an HNO3 storage tank and also comprises a PSG removal tank, an etching tank, a first cleaning tank, an alkaline cleaning tank, an acid neutralization tank, a second cleaningtank, an acid pickling tank and a third cleaning tank which are orderly arranged along a silicon wafer transport direction. The water storage tank communicates with the etching tank, the first cleaning tank and the second cleaning tank through solenoid valves with flow meters. The HF storage tank communicates with the PSG removal tank and the etching tank through solenoid valves with the flow meters. The HNO3 storage tank communicates with the etching tank and the acid pickling tank through solenoid valves with flow meters. By using the silicon wafer wet-etching device, the automatic adding of a corresponding chemical reagent in a corresponding process tank can be realized, the measurement of adding can be ensured, and the proportion of corresponding solutions in the process tank can be ensured.

Description

technical field [0001] The invention relates to the field of wet etching of solar cells, in particular to a silicon wafer wet etching device. Background technique [0002] As we all know, solar photovoltaic power generation has become a major strategic measure to ensure the strategic security of my country's energy supply, significantly reduce emissions and ensure sustainable development due to its significant advantages such as cleanliness, continuous flow, and safety. The use of solar power to generate electricity is inseparable from solar cells, and thus cannot be separated from the important process of producing cells-wet etching. [0003] In the prior art, such as the Chinese invention patent application, application number 201410699196.8 discloses a wet etching method and device for solar cells, the device includes an etching tank, a first cleaning tank, an alkali cleaning tank, and a second cleaning tank placed in sequence Tank, pickling tank and third cleaning tank;...

AI Technical Summary

Problems solved by technology

However, the wet etching device of the above-mentioned solar cells cannot realize the automatic addition of chemical reagents at all times.

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