Coater as well as scraping and wiping apparatus thereof

Abstract

The invention discloses a scraping and wiping apparatus for a coater. The apparatus comprises the following components: a scraping and wiping base; a driving motor which is arranged in a blocking chamber for driving the scraping and wiping base, wherein the driving motor and the scraping and wiping base are connected through a connecting rod, and the blocking chamber comprises an accommodating zone for installing the driving motor and a blocking zone which is arranged between the scraping and wiping base and the accommodating zone, the blocking zone and the accommodating zone are communicated,and the blocking zone is used for separating a working zone where the scraping and wiping base exists and the accommodating zone. The invention also discloses the coater. The coater as well as the scraping and wiping apparatus can enhance isolation effects, effectively avoids splashing of photoresist to a driving source, so that scraping and wiping effects as well as normal working of equipment are guaranteed; the structure is simple and concise, transmission is safe and reliable, and maintenance is facilitated.

Description

technical field [0001] The invention relates to the field of display panel manufacturing, in particular to a coating machine and a wiping device thereof. Background technique [0002] Existing technology In the TFT LCD industry, the coating machine is an indispensable piece of equipment. The coating machine uniformly coats the photoresist on the substrate, so as to carry out the subsequent photoresist exposure, development and other processes, and complete the transfer of the photomask image. carve. Among them: the mechanism that spits out the photoresist from the coating machine is called the mouthpiece, and the mouthpiece is made of high-precision processed materials. The cleanliness of the coating has a great impact on the coating yield. The photoresist residue of the coating directly affects the coating effect. If the cleanliness is not enough, the product will be reworked or scrapped, which will affect the yield. [0003] The wiping structure of mainstream coating mac...

AI Technical Summary

Problems solved by technology

The cleanliness of the coating has a great influence on the coating yield. The photoresist residue of the coating directly affects the coating effect. If the cleanliness is not enough, the product will be reworked or scrapped, which will affect the yield

[0003] The wiping structure of mainstream coating machine manufacturers currently has the following technical defects: the working area for coating is directly exposed to the area where the photoresist is spit out from the mouth, and a large amount of photoresist is splashed to the driving source, which is likely to cause abnormal wiping and driving operation. Abnormal movement

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