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Laser crystallization device and method for controlling crystallization laser beam

A laser crystallization and laser beam technology, applied in lasers, laser welding equipment, laser parts and other directions, can solve the problem of uneven crystallinity of amorphous silicon layer, and achieve the effect of improving crystallization quality

Active Publication Date: 2021-11-05
SAMSUNG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In the case where the intensity, irradiation angle, etc. of the laser beam irradiated at this time are not uniform, there is a problem that the crystallinity of the amorphous silicon layer may not be uniform

Method used

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  • Laser crystallization device and method for controlling crystallization laser beam
  • Laser crystallization device and method for controlling crystallization laser beam
  • Laser crystallization device and method for controlling crystallization laser beam

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Embodiment Construction

[0044] Advantages and features of the present invention, and methods for achieving them will become apparent when referring to the accompanying drawings and embodiments described in detail hereinafter. However, the present invention can be realized in different forms, and is not limited to the embodiments disclosed below, but the purpose of providing this embodiment is to make the disclosure of the present invention complete, and to give a basic understanding to the technical field to which the present invention belongs. It is provided for persons with knowledge to fully describe the scope of the invention, and the present invention is defined only by the scope required by the appended claims. Therefore, in various embodiments, in order to prevent the present invention from being ambiguously interpreted, well-known process steps, well-known element structures, and well-known technologies are not described in detail. Throughout the specification, the same reference numerals ref...

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Abstract

The invention discloses a laser crystallization device capable of emitting a uniform laser beam to crystallize a high-quality amorphous silicon layer and a control method for the crystallization laser beam. The laser crystallization device of the invention includes a laser crystallization device capable of emitting a laser beam A laser beam generating part, a homogenizer for homogenizing the laser beam, and a light diffusing part, and the homogenizer includes a beam splitting lens and a stacking mirror.

Description

technical field [0001] Embodiments of the present invention relate to a laser crystallization device, in particular to a laser crystallization device capable of emitting a uniform laser beam to achieve high-quality crystallization of an amorphous silicon layer and a method for controlling the crystallization laser beam. Background technique [0002] Generally, an organic light-emitting display device or a liquid crystal display device or the like uses a thin film transistor to control whether or not to emit light or the degree of light emission of each pixel. Such a thin film transistor includes a semiconductor layer, a gate electrode, a source electrode / drain electrode, and the like, and polysilicon obtained by crystallizing amorphous silicon is mainly used as the semiconductor layer. [0003] The manufacturing process of a thin film transistor substrate having the above thin film transistor or a display device using the thin film transistor substrate will be described, by ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B23K26/53B23K26/06B23K26/064H01L21/02
CPCH01L21/02675B23K26/064B23K26/0648B23K26/53H01S3/0064H01S3/2256H01S3/034
Inventor 李童敏全祥皓姜美在徐宗吾苏炳洙
Owner SAMSUNG DISPLAY CO LTD
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