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PVD (physical vapor deposition)-based surface gradient film preparation device

A technology of thin film preparation and surface gradient, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problem that the flux of the source cannot be changed arbitrarily, and achieve the effect of enhancing controllability

Pending Publication Date: 2018-06-01
ZHEJIANG UNIV OF TECH
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  • Abstract
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  • Claims
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Problems solved by technology

[0006] In order to overcome the defect that existing PVD devices for preparing gradient films cannot arbitrarily change the flux of the source, the present invention provides a PVD-based surface gradient film preparation device, which can prepare a continuous gradient gradient distribution of components on the substrate multi-layer film

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  • PVD (physical vapor deposition)-based surface gradient film preparation device
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  • PVD (physical vapor deposition)-based surface gradient film preparation device

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Embodiment Construction

[0022] The present invention will be further described below in conjunction with the accompanying drawings.

[0023] refer to Figure 2 ~ Figure 6 , a surface gradient film preparation device based on PVD, comprising a vacuum chamber 20, a substrate 19, a main chamber 18 and a source component, the substrate 19 and the main chamber 18 are respectively arranged on the upper and lower sides of the vacuum chamber 20 On both sides, said source component is arranged in said main chamber 18;

[0024] The source components include a stepper motor 6, a pinion 8, a bull gear 9, a sub-chamber 14, a source material 15 for coating the substrate, a crucible 16, a semicircle shield for shielding the microscopic particles of a part of the source that escapes. Plate 12 and a crystal oscillator plate 13 for real-time measurement of the flux of the source, the stepper motor 6 is fixed on the inner wall of the main chamber 18 through a bracket, and the pinion is fixed on the motor shaft of the ...

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Abstract

The invention discloses a PVD (physical vapor deposition)-based surface gradient film preparation device. The device comprises a vacuum chamber, a substrate, a main chamber and source components, wherein the substrate and the main chamber are arranged on the upper side and the lower side of the vacuum chamber respectively, and the source components are arranged in the main chamber; each source component comprises a stepping motor, a pinion, a large gear, a sub-chamber, a source material used for coating the substrate with a film, a crucible, a semicircular shielding plate used for shielding disperse microscopic particles of part of sources as well as a quartz vibrator used for measuring the flux of sources in real time, the pinion is fixed on a motor shaft of the stepping motor, the semicircular shielding plate is rotationally mounted on one side of an opening in the upper end of the sub-chamber, the pinion is meshed with the gear wheel, and the gear wheel is meshed with a tooth-shapedstructure on the semicircular shielding plate. By means of the provided PVD-based surface gradient film preparation device, multi-element films with components distributed in a continuous and gradient manner can be prepared on the substrate.

Description

technical field [0001] The invention relates to the technical field of high-throughput film preparation, in particular to a PVD-based surface gradient film preparation device. Background technique [0002] With the improvement of people's living standards, the performance requirements of products are getting higher and higher. The performance of the product depends on the service performance of the material. Therefore, we need to develop materials with better comprehensive properties to meet people's growing needs. However, bulk materials are expensive and not ideal. A thin film is coated on the surface of the bulk material by PVD method. This thin film has excellent performance, and the base material is a common material. This not only saves material costs, but also enhances the service performance of the material. It can be said to kill two birds with one stone. [0003] Therefore, the thin film prepared by PVD on the substrate is very important and directly related to ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/58C23C14/54C23C14/04
CPCC23C14/044C23C14/24C23C14/543C23C14/5806
Inventor 朴钟宇余光磊郑秋阳周仁泽周振宇
Owner ZHEJIANG UNIV OF TECH
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