Chemical dosing device and control method thereof

Abstract

The invention discloses a chemical dosing device and a control method thereof. The chemical dosing device comprises a chemical constant-pressure tank, a chemical dosing electromagnetic valve and a controller, wherein the chemical constant-pressure tank is of a closed tank body; a chemical inlet is formed in the tank; a float valve is arranged at the chemical inlet; the chemical dosing electromagnetic valve is arranged on the chemical constant-pressure tank and used for releasing a chemical from the chemical constant-pressure tank according to a pulse control signal sent by the controller; thecontroller is used for generating the pulse control signal according to a required chemical amount per unit time and sending the pulse control signal to the chemical dosing electromagnetic valve, so as to control the chemical dosing electromagnetic valve to release the required chemical from the chemical constant-pressure tank. The chemical dosing device disclosed by the invention has the following advantages that: the chemical constant-pressure tank ensures that pressure at an outlet of a valve is constant; the chemical constant-pressure tank is periodically opened and closed through the chemical dosing electromagnetic valve in a fixed-pulse-width variable-frequency manner, so as to accurately control the chemical flow and improve the chemical dosing stability; valve parameters are corrected in the fixed-pulse-width variable-frequency manner to strictly restrain an action frequency of the chemical dosing electromagnetic valve to avoid an abnormal temperature rise and prolong the service life of the chemical dosing electromagnetic valve.

Description

technical field [0001] The invention relates to the technical field of dosing equipment, in particular to a dosing device and a control method thereof. Background technique [0002] The dosing system is widely used in non-ferrous metal beneficiation, extraction and other production processes that require quantitative addition of liquid chemicals. The veneer dosing machine appeared in large-scale mineral processing plants in China in the late 1980s and was widely used for reference by other mineral processing plants. Its advantage is that it replaces manual or measuring instruments, and realizes constant automatic dosing with a single-chip microcomputer as the core, and the flow rate is adjusted. There is no need to manually interfere with the valve or measuring cup of the equipment, and only need to set the flow rate on the input operator provided by the equipment, but its shortcomings are also obvious. The single-chip microcomputer is mainly based on the printed circuit boa...

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Problems solved by technology

[0004] PLC electromagnetic valve type dosing machine has also appeared on the market now, which has better solved the service life problem of control elements and adding devices, but its constant pressure device has selected a column type float valve and still does not solve the problem of liquid at the front end of the electromagnetic valve. The problem of surface stability; the working principle of the solenoid valve is the constant frequency variable pulse width method. This method does not consider the influence of the change of the orifice section on the flow rate when the solenoid valve closes and opens. When the pulse width is longer (large flow rate is added) The flow has little effect, but the impact on the actual flow is more serious for the pulse width is very narrow (when the small flow is added)

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