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Vertical double diffusion metal-oxide-semiconductor power device with high voltage start-up unit

An oxide semiconductor and vertical double-diffusion technology, which is applied in semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve problems such as integrated circuit startup failure

Inactive Publication Date: 2018-07-06
LEADTREND TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, because the start-up current is very small, the predetermined capacitor will take a long time to generate the start-up voltage, that is to say, it may take a long time for the integrated circuit to operate normally, or it may be generated too slowly. The starting voltage causes the integrated circuit to fail to start

Method used

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  • Vertical double diffusion metal-oxide-semiconductor power device with high voltage start-up unit
  • Vertical double diffusion metal-oxide-semiconductor power device with high voltage start-up unit
  • Vertical double diffusion metal-oxide-semiconductor power device with high voltage start-up unit

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Embodiment Construction

[0050] Please refer to figure 1 , figure 1 It is a cross-sectional view of a vertical double diffused metal-oxide-semiconductor (VDMOS) power device 100 with a high-voltage start-up unit disclosed in the first embodiment of the present invention. Such as figure 1 As shown, the vertical double diffused metal oxide semiconductor power device 100 includes a vertical double diffused metal oxide semiconductor power transistor 102 and a high voltage starting unit 104, wherein the high voltage starting unit 104 is a junction field effect transistor (junction field effect transistor, JFET ). But the present invention is not limited to the vertical double diffused metal oxide semiconductor power device 100 comprising a vertical double diffused metal oxide semiconductor power transistor, that is to say, the vertical double diffused metal oxide semiconductor power device 100 may comprise more than one vertical double diffused Diffused Metal Oxide Semiconductor Power Transistors. Such...

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Abstract

The invention discloses a vertical double diffusion metal-oxide-semiconductor power device with high voltage start-up unit. The vertical double diffusion metal-oxide-semiconductor power device includes a vertical double diffusion metal-oxide-semiconductor power transistor and the high voltage start-up unit. The vertical double diffusion metal-oxide-semiconductor power transistor includes a first metal layer, a substrate layer, an epitaxy layer, a second metal layer, and a plurality of polysilicon layers. The substrate layer is formed on the first metal layer. The epitaxy layer is formed on thesubstrate layer. The plurality of polysilicon layers are formed on the epitaxy layer. The high voltage start-up unit is formed on the epitaxy layer, wherein the high voltage start-up unit is used forproviding a two-dimensional direction start-up current to the vertical double diffusion metal-oxide-semiconductor power device. Accordingly, the vertical double diffusion metal-oxide-semiconductor power device can normally work in a short time.

Description

technical field [0001] The invention relates to a vertical double-diffusion metal oxide semiconductor power element, in particular to a vertical double-diffusion metal oxide semiconductor power element with a high-voltage starting unit. Background technique [0002] In the prior art, when an integrated circuit is powered on, a high-voltage start-up unit in the integrated circuit will generate a start-up current to charge a predetermined capacitor, wherein the predetermined capacitor will generate a start-up voltage according to the start-up current Other functional units within the integrated circuit are activated. However, because the start-up current is very small, the predetermined capacitor will take a long time to generate the start-up voltage, that is to say, it may take a long time for the integrated circuit to operate normally, or it may be generated too slowly. The starting voltage causes the integrated circuit to fail to start. Therefore, how to increase the star...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/78H01L29/06H01L27/088
CPCH01L27/088H01L29/0603H01L29/7802H01L29/8086H01L29/0692H01L29/0843H01L29/1066H01L29/7815H01L29/7803H01L29/0649H01L21/76202H01L21/26513H01L29/7811
Inventor 叶人豪
Owner LEADTREND TECH
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