A screw component and a radio frequency processing device for its application

Abstract

The invention provides a screw assembly, including a clamping plate and a stainless steel shrapnel. The clamping plate comprises an upper layer clamping plate, a lower layer clamping plate, and a clamping plate opening between the upper layer clamping plate and the lower layer clamping plate. A screw hole holding a screw is arranged through the clamping plate. The stainless steel shrapnel is in the clamping plate opening. The stainless steel shrapnel is provided with a round opening corresponding to the screw hole. The region of the stainless steel shrapnel, close to the round opening, and theregion close to the edge are in different planes. An acute angle is between the region of the stainless steel shrapnel, close to the round opening, and the upper layer clamping plate, and an acute angle is between the region of the stainless steel shrapnel, close to the edge region, and the lower layer clamping plate. The screw assembly is provided with an anti-loose mechanism, and can effectively ensure good contact of the screw assembly and a screw. The screw assembly ensures path stability of a radio frequency current loop, to prevent impedance of the radio frequency loop from changing, soas to ensure that a radio frequency discharge condition would not drift.

Description

Technical field [0001] The present invention relates to the technical field of radio frequency, in particular to the technical field of a screw assembly used in a radio frequency processing device to ensure the stability of a radio frequency signal. Background technique [0002] In the field of radio frequency processing technology, especially in the technology involving plasma etching, in order to ensure that the plasma has a strong directionality for the etching of the substrate, it is usually required to feed a higher power radio frequency signal into the plasma processing device To provide sufficient bias voltage, under high-power process conditions, a relatively large RF current will be generated in the plasma processing device. The bias radio frequency signal is usually applied to the susceptor for supporting the substrate. In order to form a current loop, the plasma processing device also needs to provide a channel that can ensure that the radio frequency current forms a c...

AI Technical Summary

Problems solved by technology

However, since the plasma processing device generates a large amount of heat during the working process, the aluminum screws and the aluminum gaskets are more likely to loosen during the thermal cycle, and it is difficult to set the anti-loosening device due to the insufficient hardness of the aluminum gaskets. mechanism

The loosening of screws and gaskets will lead to the loosening of the fixed components, affecting the path of the RF current, resulting in changes in the impedance of the RF circuit, causing the condition of the RF discharge to drift, and affecting the stability of the plasma process.

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