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Apparatus and methods for photomask backside cleaning

一种光掩模、掩模的技术，应用在清洁方法和用具、用于光机械处理的原件、光机械设备等方向

Active Publication Date: 2018-07-17
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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This presents various engineering challenges

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  • Apparatus and methods for photomask backside cleaning
  • Apparatus and methods for photomask backside cleaning
  • Apparatus and methods for photomask backside cleaning

Examples

Experimental program
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Embodiment Construction

[0011] Such as Figure 1-3 As shown in , a photomask cleaning apparatus 10 includes a base plate 12 mountable to the deck of a processing system having a plurality of other processing devices or modules and one or more for moving workpieces between the modules. More robots. Pins 18 on holder 16 are adapted to support photomask 22 . The holder may be supported on a lifter 20 that is movable vertically to raise and lower the holder 16 as discussed further below. Also refer to Figure 4 , the head 30 has a rotor housing 52 and an arm 48 attached to the lift / rotator 32 . The lift / rotator 32 is operable to lift and lower the head 30, and also rotate the head 30 to Figure 1-2 shown in the downward facing position and the Figure 3-4 in the face-up position shown. A frame 34 supported in a fixed position above the floor 12 has a chamber side wall 28 that is cylindrical and has a diameter nominally greater than that of the head 30 . An inflatable seal 66 (eg, an inflatable sea...

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Abstract

Apparatus for cleaning a photo mask includes a rotor in a head, with the rotor having a seal plate having a central opening, a resilient mask seal in the central opening, and retractors attached to the resilient mask seal and adapted to move the resilient mask seal into open and closed positions. A motor in the head rotates the rotor. A push plate in the head moves to operate the retractors. In the closed position the resilient mask seal seals against the sides of the photo mask. The back side of the photo mask can then be cleaned without affecting the patterned front side of the photo mask.

Description

technical field [0001] The field of the invention is apparatus and methods for backside cleaning of photomasks. Background technique [0002] Photolithography is used in the fabrication of microelectronic devices to form precise patterns on substrate surfaces. A photomask or reticle is typically a square plate of transparent material such as glass or fused silica. A photomask is initially built with a pattern to be transferred to a substrate, such as a semiconductor wafer. Following subsequent processing steps, the patterned substrate surface forms desired micro- or nano-sized electronic devices or features. Photomasks can be reused to imprint thousands of substrates. In use, the backside may become contaminated with scratches, burrs, or particles, degrading the photomask. Techniques for cleaning the backside have been proposed. However, when cleaning the backside, it is necessary to avoid affecting the patterned frontside of the photomask. This presents various engine...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/82G03F7/20H01L21/02H01L21/027
CPCG03F1/82G03F7/70925H01L21/02041H01L21/0273G03F7/707H01L21/68728B08B11/02
Inventor 杰森·赖伊凯尔·莫兰·汉森
Owner APPLIED MATERIALS INC