Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Roller type vibration auxiliary polishing device and method

A polishing device and roller-shaped technology, used in grinding drive devices, grinding/polishing equipment, machine tools for surface polishing, etc., can solve the problems of low polishing efficiency and small application range, ensure uniformity and increase the usable range. , The effect of avoiding card loading errors

Pending Publication Date: 2018-07-24
CHANGCHUN UNIV OF TECH
View PDF14 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The invention provides a roller-type vibration-assisted polishing device and method to solve the existing problems of low polishing efficiency and small application range

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Roller type vibration auxiliary polishing device and method
  • Roller type vibration auxiliary polishing device and method
  • Roller type vibration auxiliary polishing device and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0043] like figure 1 As shown, including Z-axis motion system 1, Z-axis motion system 2, Z-axis motion platform 3, X-axis motion system 1 4, X-axis motion system 2 5, X-axis motion platform 1 6, and X-axis motion system 3 7. X-direction motion platform 2 8, compound vibration platform 9, base platform 10, wherein Z-direction motion platform 3 is connected with Z-axis motion system 1 and Z-axis motion system 2 through screws, and Z-axis motion system 1 and Z Axis motion system 2 2 is connected with base platform 10 through screws, X-axis motion platform 1 6 is connected with X-axis motion system 1 4 and X-axis motion system 2 5 through screws, X-axis motion system 1 4 and X-axis motion system 2 5 Connected with the base platform 10 by screws, the X-direction motion platform 2 8 is connected with the X-axis motion system 3 7 by screws, the X-axis motion system 3 7 is connected with the base platform 10 by screws, and the polished workpiece 11 is glued to the compound vibration p...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a roller type vibration auxiliary polishing device and method, and belongs to the field of ultraprecise machining. A Z-direction motion platform is connected with a first Z-axis motion system and a second Z-axis motion system through screws, the first Z-axis motion system and the second Z-axis motion system are connected with a base platform through screws, a first X-direction motion platform is connected with a first X-axis motion system and a second X-axis motion system through screws, the first X-axis motion system and the second X-axis motion system are connected with the base platform through screws, a second X-direction motion platform is connected with a third X-axis motion system through a second screw, the third X-axis motion system is connected with the base platform through a screw, and a compound type vibration platform is connected with the second X-direction motion platform through a screw. The device and method have the beneficial effects that polishing efficiency is high, polishing uniformity and consistency are good, and polishing treatment and real-time online repairing of the curve face can be finished.

Description

technical field [0001] The invention relates to the field of ultra-precision machining, in particular to a roller-type vibration-assisted polishing method and device. Background technique [0002] With the rapid development of science and technology, not only higher requirements are put forward for the quality and integrity of the surface of parts in various fields of industry, but also the parts tend to be miniaturized gradually, which requires that the processing accuracy should be improved by one level in the traditional processing technology Therefore, ultra-precision machining technology is proposed. Ultra-precision machining technology is mainly used in large-scale integrated circuits, aerospace, semiconductors and other fields. The surface precision of the processed workpiece can reach nanometer or sub-nanometer level. In ultra-precision machining, polishing It has always been the main processing method and is usually the final step of ultra-precision machining, the p...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B24B29/02B24B29/00B24B41/02B24B1/04B24B47/04B24B53/053
CPCB24B1/04B24B29/00B24B29/02B24B41/02B24B47/04B24B53/053Y02P70/10
Inventor 谷岩林洁琼卢明明陈修元田旭周岩康洺硕张成龙杨继犇王点正张哲名徐梓苏苍新宇付斌张晋
Owner CHANGCHUN UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com