Photomask shutter door and photomask storage device

Abstract

The invention provides a photomask occluding door, comprising a first occluding plate and a second occluding plate which are arranged on one side of an opening of a photomask cabinet and used for occluding storage positions of adjacent first and second photomasks in the photomask cabinet. A direction in which the first photomask is removed from the photomask cabinet is a first direction; in the first direction, the first occluding plate and the second occluding plate include areas at least partially overlapped; the first occluding plate and the second occluding plate are staggered on the lateral side of the opening of the photomask cabinet; the first occluding plate and the second occluding plate are in slidable connection; when accessing the first photomask is required, the first occluding plate is moved to the second occluding plate; when accessing the second photomask is required, the second occluding plate is moved to the first occluding plate. The photomask occluding door with theabove arrangements allows the first occluding plate or the second occluding plate to be partially opened, so that the photomask cabinet is exposed to surrounding space to less degree, and the risk for dust particulate matters to enter and deposit in the photomask cabinet is reduced. The invention also provides a photomask storage apparatus.

Description

Technical field [0001] The invention belongs to the technical field of photomask storage, and in particular relates to a photomask shielding door and a photomask storage device. Background technique [0002] The reticle cabinet is a device for storing reticles. The reticles are arranged in multiple layers in the reticle cabinet. The existing reticle cabinets have one side opening and are directly exposed to the surrounding environment. Long-term placement will cause dust particles to deposit. On the surface of the reticle, the reticle is dirty or even damaged. In addition, a large amount of dust particles will accumulate in the reticle cabinet, which will indirectly contaminate the stored reticle. [0003] The existing method of dealing with dust particles is to add a cleaning process. However, there are dead corners in the mask cabinet, which are difficult to clean. The dust particles on the surface of the mask can also easily scratch the mask during the cleaning process, which af...

AI Technical Summary

Problems solved by technology

[0002] The photomask cabinet is a device used to store photomasks. The photomasks are arranged in multiple layers in the photomask cabinet. The existing photomask cabinet is open and bright on one side and is directly exposed to the surrounding environment. Long-term placement will cause dust particles to accumulate. On the surface of the photomask, the photomask will be dirty or even damaged due to aging. In addition, a large amount of dust particles will accumulate in the photomask cabinet, which will indirectly pollute the stored photomask.

[0003] The existing method to deal with dust particles is to add a cleaning process. However, there are dead corners in the photomask cabinet, which are difficult to clean, and the dust particles on the surface of the photomask are also very easy to scratch the photomask during the cleaning process, affecting the quality of the photomask. Yield

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