Device and method for measuring secondary electron emission coefficient of metal materials in low energy range
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- XIAN INSTITUE OF SPACE RADIO TECH
- Publication Date
- 2021-02-05
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Abstract
Description
technical field
[0001] The invention relates to a method for measuring the secondary electron emission coefficient of a metal material in a low energy range, belonging to the field of microdischarge of microwave components. Background technique
[0002] The micro-discharge effect is an important factor affecting the performance and reliability of high-power microwave components of spacecraft, and the secondary electron emission coefficient has a significant impact on the micro-discharge threshold; in order to establish a secondary electron emission model on the surface of microwave components, it is necessary to accurately measure the secondary electron Emission coefficient: International studies have shown that the secondary electron emission coefficient in the low energy range has a significant impact on the micro-discharge threshold.
[0003] At present, most of the secondary electron emission characteristic measurement platforms at home and abroad can only measure the se...