Overlay mark and its reliability verification method
A technology of overlay marking and verification method, which is applied in the field of semiconductor manufacturing, can solve the problems of inaccurate measurement of overlay accuracy of thick photoresist, and achieve the effect of improving accuracy
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[0043] The specific implementation of the overlay mark and its reliability verification method provided by the present invention will be described in detail below in conjunction with the accompanying drawings.
[0044] This specific embodiment provides an overlay mark, with figure 1 It is a structural schematic diagram of an overlay mark in a specific embodiment of the present invention. Such as figure 1 As shown, the overlay mark provided by this specific embodiment includes a first measurement mark 21 (also referred to as a front layer measurement mark) formed in a first layer (also referred to as a front layer) and a A second measurement mark 22 (also referred to as a rear layer measurement mark) in a second layer (also referred to as a rear layer or a current layer), wherein the second layer is formed after the first layer. In some embodiments, the second layer is adjacent to the first layer. In some embodiments, the second measurement marking 22 is visible at the same ...
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