Parallel motion mechanism adjusting device based on double-axis flexure hinge

Abstract

The invention discloses a parallel motion mechanism adjusting device based on a double-axis flexure hinge. The device comprises a driven linear motion component and a driven guiding mechanism, an active linear motion component is assembled in an active guiding mechanism, a two-dimensional adjusting module is fixedly arranged on the active linear motion component through fixed screws, a connectingbase plate is assembled on the two-dimensional adjusting module through two installation screws, the connecting base plate is clamped and positioned through an upper adjusting positioning nut and a lower adjusting positioning nut so as to be connected with the driven linear motion component, and the two-dimensional adjusting module is formed by assembling lateral deflection chamfer type hinges andlongitudinal deflection chamfer type hinges which are mutually vertical in the deflection direction. According to the device, the stable reliability of an exposure device, the positioning precision of the motion mechanism and the scanning accuracy of an exposure window are improved, and the device is wide in using range, reasonable and simple in structure and reliable to use.

Description

technical field [0001] The invention belongs to the technical field of precision instruments and machinery, and in particular relates to a parallel motion mechanism adjustment device based on a biaxial flexible hinge. Background technique [0002] The lithography machine is the most demanding and complex equipment in the integrated circuit manufacturing equipment. It integrates key technologies such as optics, precision measurement, control, and machinery; the exposure system of the lithography machine is the key equipment in the lithography machine. The high-speed, high-acceleration and high-precision movement requirements of optical blades put forward high control precision requirements for the blades. In order to improve the control accuracy of the vertical scanning light blocking blade in the exposure system, a gravity compensation device is added to the system to compensate the gravity of the vertical blade. Due to the assembly error of the system, the gravity compensa...

AI Technical Summary

Problems solved by technology

This invention can effectively adjust the attitude of the probe, but it cannot be adjusted in real time under dynamic conditions, and the structure is not compact enough

[0004] Patent CN205618904U "A Parallel Adjustment Mechanism for Hydraulic Die Storage Elevator" proposes a parallel adjustment mechanism applied to the hydraulic mold storage lifter; the parallel adjustment mechanism includes a positioning seat, an adjustment stud and a nut. There is a hole on the base of the lift, the positioning seat is arranged at the bottom of the base, one end of the adjusting stud passes through the hole and is fixed with the positioning seat, and the other end of the adjusting stud is screwed on On the nut, the nut is welded and fixed on the surface of the base; this invention can effectively adjust the parallelism of the elevator, but it cannot be adjusted in real time under dynamic conditions

[0005] The disadvantage of the above-mentioned prior art is that the parallelism of the parts cannot be adjusted when the parts are moving.

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