Semiconductor structures and methods of forming them
A technology of semiconductor and gate structure, applied in the field of semiconductor structure and its formation, can solve the problems that the performance of semiconductor devices needs to be further improved, the ability of the performance of semiconductor devices is limited, etc.
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[0034] There are many problems in the method of forming the semiconductor structure, for example, the performance of the semiconductor device is poor.
[0035] Combining with a method of forming a semiconductor structure, the reasons for the poor performance of semiconductor devices are analyzed:
[0036] Figure 1 to Figure 2 It is a structural schematic diagram of each step of a method for forming a semiconductor structure.
[0037] Please refer to figure 1 , provide a substrate 100, the substrate 100 includes: a first region I and a second region II, the substrate 100 of the first region I has a first gate structure 101, and the substrate 100 of the second region II has a second Gate structure 102; forming a first lightly doped region 103 in the substrate 100 on both sides of the first gate structure 101; forming a second lightly doped region in the substrate 100 on both sides of the second gate structure 102 District 104.
[0038] The first region I is used to form NMO...
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