Polishing pad and polishing method
A polishing pad and polishing table technology, which is applied in the direction of grinding/polishing equipment, surface polishing machine tools, chemical instruments and methods, etc., and can solve problems such as inability to polish and insufficient polishing
Inactive Publication Date: 2018-10-23
FUJIMI INCORPORATED
View PDF4 Cites 1 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
However, in polishing using the cloth disclosed in Patent Document 1 as a polishing pad, depending on the shape and size of the protrusions, it may not be possible to sufficiently polish the portion near the protrusions on the surface of the object to be polished.
[0004] The same applies to the polishing of a polishing object having a concave portion on the surface. In polishing using a conventional polishing pad made of suede or polishing using the cloth disclosed in Patent Document 1 as a polishing pad, sufficient polishing may not be possible. to the inner surface of the recess
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0020] One embodiment of the present invention will be described in detail. In addition, the following embodiment shows an example of this invention, and this invention is not limited to this embodiment. In addition, various changes or improvements can be added to the following embodiment, and the aspect which added such a change or improvement can also be included in this invention.
[0021] like figure 1 As shown, the polishing pad of the present embodiment has the raised napped portion 1 formed by a plurality of fibers 12 having a length L of 3 mm or more raised on the surface of the base portion 11 . The number of fibers 12 with a length L of 3 mm or more standing on the surface of the base 11 is 10000 / cm 2 above.
[0022] When using conventional polishing pads made of suede, non-woven fabrics, polyurethane, etc. figure 2 The polishing object 2 having the convex portion 21 on the surface as shown, Figure 4 When the polishing object 2 having the concave portion 22 o...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
| Property | Measurement | Unit |
|---|---|---|
| length | aaaaa | aaaaa |
| size | aaaaa | aaaaa |
| particle size | aaaaa | aaaaa |
Login to View More
Abstract
Provided is a polishing pad with which it is possible, when polishing an object to be polished that has a convex part and / or a concave part on the surface thereof, to adequately polish the portion near the convex part and / or the inner surface of the concave part on the surface of the object to be polished. The polishing pad has an erect fiber part (1) in which a plurality of fibers (12) having a length of 3 mm or more are provided to be erect on the surface of a base part (11), the number of fibers (12) being 10,000 / cm2 or higher.
Description
technical field [0001] The invention relates to a polishing pad and a polishing method. Background technique [0002] When using, for example, a conventional polishing pad made of suede (Japanese: スウェード) to polish a polishing object having a convex portion on the surface, most of the surface of the polishing object can be polished, but due to the deformability of the polishing pad Insufficient, therefore, the vicinity of the convex portion on the surface of the object to be polished does not come into contact with the polishing pad, and sufficient polishing may not be possible. [0003] If a cloth (for example, referring to Patent Document 1) having a raised napped portion formed by fibers is used as a polishing pad, the raised napped portion may be highly deformable, so the raised napped portion may also be in contact with the surface of the object to be polished. Near parts of the protrusions are in contact with each other. However, in polishing using the cloth disclosed...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Applications(China)
IPC IPC(8): B24B37/24B24B37/22B24D11/00H01L21/304
CPCA47L13/16B24B3/28B24B3/32B24B29/005B24B37/22B24B37/24B24B37/26B24D11/02B32B3/08B32B5/022B32B5/18B32B5/245B32B25/045B32B2250/02B32B2262/065B32B2266/0207B32B2266/0221B32B2266/0228B32B2266/0235B32B2266/025B32B2266/0278B32B2266/0285B32B2307/51B32B2307/732H01L21/304B24D11/00B32B5/12
Inventor 浅井舞子伊藤友一玉井一诚田原宗明
Owner FUJIMI INCORPORATED