A wafer photolithography method
A wafer, wafer technology, applied in optics, optomechanical equipment, instruments, etc., can solve the problems of limitations, low level of suction cups, etc.
Active Publication Date: 2021-06-15
深圳市中科光芯半导体科技有限公司
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Problems solved by technology
Although this technical solution can adjust the level of the suction cup, the technical solution can only adjust the level of the suction cup at a single angle, and the adjustment is realized by combining manual and naked eyes, resulting in the low level of the suction cup; restricted
Method used
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[0039] As an embodiment of the present invention, the air supply unit 6 includes a rotating disk 61, a spherical stopper 62 and a spherical air supply block 63; the rotating disk 61 is fixedly connected to the rotating shaft of the motor, and the bottom surface of the rotating disk 61 is provided with There is an electromagnet 64, and the top surface of the rotating disk 61 is provided with three No. 1 slots, and the three No. 1 slots are evenly distributed in a circular array; the spherical stopper 62 is installed in the No. 1 slot by means of a movable rod 65. The outer layer of the movable rod 65 is covered with a spring, and the bottom end of the movable rod 65 is provided with a magnet, and the magnet is used to cooperate with the electromagnet 64; the installation method of the spherical air supply block 63 and the spherical stopper 62 is consistent; The number of the spherical stopper 62 is two, and the number of the spherical air supply block 63 is one. The motor drive...
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The invention belongs to the technical field of semiconductors, and specifically relates to a wafer photolithography method. The gluing device used in the method includes a suction cup, a mounting seat, a rotating disk, and a No. 1 motor. The rotating disk is located in the mounting seat, and the No. 1 motor It is used to drive the rotating disk to rotate; it also includes a liquid storage tank, a liquid level sensor, an adjustment module and a controller; the liquid level sensor is used to detect the inclination of the suction cup by cooperating with the liquid storage tank; the adjustment module is used to adjust the level of the suction cup, And the adjustment module is installed on the top surface of the rotating disk through the fixed rod; the liquid level sensor judges whether the suction cup is in a horizontal position by detecting the liquid level in the liquid storage tank; when the suction cup is inclined, the controller communicates with the adjustment module and the liquid The position sensor cooperates to adjust the suction cup to the horizontal position. The invention is mainly used in the wafer photolithography process, can automatically adjust the levelness of the sucker, can avoid the shaking of the sucker, and improves the gluing efficiency of the wafer.
Description
technical field [0001] The invention belongs to the technical field of semiconductors, in particular to a wafer photolithography method. Background technique [0002] The photolithography process includes the steps of wafer leveling, that is, coating layer, pre-baking, exposure, development, film hardening, corrosion, and degumming. Among them, the leveling is to make the photoresist distributed on the wafer evenly distributed and able to Reach a certain thickness, so that the photoresist on the surface of the wafer can be properly photosensitive during exposure; when uniforming the glue, a motor is usually used to drive the wafer adsorbed on the vacuum chuck to rotate, so that the glue is evenly distributed under the action of centrifugal force On the wafer, the thickness of the adhesive film coating can be controlled according to the speed of the motor's rotating shaft. However, since the workbench may not be in a horizontal state during installation, the vacuum chuck is ...
Claims
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IPC IPC(8): G03F7/16
CPCG03F7/162
Inventor 王青江振
Owner 深圳市中科光芯半导体科技有限公司