Wafer coating system for lithography machine
A technology for wafers and lithography machines, which is applied to photoplate-making process coating equipment, electrical components, circuits, etc., can solve problems such as limitations and low levelness of the suction cup, and achieve increased rigidity, improved adjustment efficiency and adjustment accuracy, The effect of improving uniformity
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[0026] As an embodiment of the present invention, the air supply unit 6 includes a rotating disk 61, a spherical stopper 62 and a spherical air supply block 63; the rotating disk 61 is fixedly connected to the rotating shaft of the No. 3 motor, and the bottom of the rotating disk 61 An electromagnet 64 is provided on the surface, and three No. 1 grooves are arranged on the top surface of the rotating disk 61, and the three No. 1 grooves are evenly distributed in a circular array; the spherical stopper 62 is installed in the No. Among them, the outer layer of the movable rod 65 is covered with a spring, and the bottom end of the movable rod 65 is provided with a magnet, and the magnet is used to cooperate with the electromagnet 64; the installation method of the spherical air supply block 63 and the spherical stopper 62 is consistent ; The number of the spherical block 62 is two, and the number of the spherical air supply block 63 is one. The No. 3 motor drives the rotating dis...
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