A method for preparing tantalum biocoating by magnetron sputtering on the surface of magnesium alloy
A magnetron sputtering, bio-coating technology, applied in metal material coating process, coating, sputtering and other directions, can solve the problem of unsatisfactory biocompatibility, poor corrosion resistance, loss of mechanical properties, etc. problem, to achieve good bone-inducing activity, good coating adhesion, and good bone conductivity.
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Embodiment 1
[0050] Preparation of tantalum biocoating on magnesium alloy surface by magnetron sputtering.
[0051] Such as Figure 5 Shown in the process flow chart, the present embodiment carries out according to the following steps:
[0052] 1. Sample grinding and cleaning: the sample is polished with 200#-2000# sandpaper, washed in cold water, degreased with acetone, ultrasonically cleaned with ethanol, and then dried for use;
[0053] 2. Installation: Install the sample, aluminum (Al) target, and tantalum (Ta) target into the magnetron sputtering chamber, ensuring that the distance between the sample surface and the target is 8cm;
[0054]3. Vacuumize and fill with argon: vacuumize the magnetron sputtering chamber to ≤1×10 -3 Pa, filled with argon to 0.4Pa;
[0055] 4. Preparation of aluminum (Al) transition layer by magnetron sputtering:
[0056] 4a. Select an aluminum (Al) target;
[0057] 4b. Adjust the voltage to 265V, and magnetron sputtering for 5 minutes;
[0058] 4c. Tur...
Embodiment 2
[0067] Preparation of tantalum biocoating on magnesium alloy surface by magnetron sputtering.
[0068] Such as Figure 5 Shown in the process flow chart, the present embodiment carries out according to the following steps:
[0069] 1. Sample grinding and cleaning: the sample is polished with 200#-2000# sandpaper, washed in cold water, degreased with acetone, ultrasonically cleaned with ethanol, and then dried for use;
[0070] 2. Installation: Install the sample, aluminum (Al) target, and tantalum (Ta) target into the magnetron sputtering chamber, ensuring that the distance between the sample surface and the target is 9cm;
[0071] 3. Vacuumize and fill with argon: vacuumize the magnetron sputtering chamber to ≤1×10 -3 Pa, filled with argon to 0.4Pa;
[0072] 4. Preparation of aluminum (Al) transition layer by magnetron sputtering:
[0073] 4a. Select an aluminum (Al) target;
[0074] 4b. Adjust the voltage to 270V, and magnetron sputtering for 7 minutes;
[0075] 4c. Tu...
Embodiment 3
[0083] Preparation of tantalum biocoating on magnesium alloy surface by magnetron sputtering.
[0084] Such as Figure 5 Shown in the process flow chart, the present embodiment carries out according to the following steps:
[0085] 1. Sample grinding and cleaning: the sample is polished with 200#-2000# sandpaper, washed in cold water, degreased with acetone, ultrasonically cleaned with ethanol, and then dried for use;
[0086] 2. Installation: Install the sample, aluminum (Al) target, and tantalum (Ta) target into the magnetron sputtering chamber, ensuring that the distance between the sample surface and the target is 10cm;
[0087] 3. Vacuumize and fill with argon: vacuumize the magnetron sputtering chamber to ≤1×10 -3 Pa, filled with argon to 0.4Pa;
[0088] 4. Preparation of aluminum (Al) transition layer by magnetron sputtering:
[0089] 4a. Select an aluminum (Al) target;
[0090] 4b. Adjust the voltage to 275V, and magnetron sputtering for 8 minutes;
[0091] 4c. T...
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