A method for reducing the photomask fog surface defects through humidity modification
A mask and matte technology, applied in the field of microelectronics, can solve the problems of repeated defects, high incidence of fog-like defects, easy breeding of haze, etc., and achieve the effect of ensuring equipment accuracy and improving growth conditions.
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[0024] It should be noted that, in the case of no conflict, the following technical solutions and technical features can be combined with each other.
[0025] The specific embodiment of the present invention will be further described below in conjunction with accompanying drawing:
[0026] Such as figure 1 As shown, a method for reducing the fog surface defect of photomask 1 through humidity transformation is applicable to ArF excimer laser equipment for performing the exposure process of photomask 1, and the above-mentioned ArF excimer laser equipment includes a mask for performing the above-mentioned exposure process stage and a gas pipeline 3 for delivering compressed dry air (Compressed dry air, CDA) to the above-mentioned mask stage 2 during the above-mentioned exposure process, the above-mentioned method includes:
[0027] Above-mentioned ArF excimer laser equipment is positioned at above-mentioned mask stage 2 ( figure 1 The area enclosed by the middle circle is the m...
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