42 results about "Excimer laser device" patented technology

To provide an excimer laser device and method in which the frequency of full gas exchange within the laser chamber is reduced, and more preferably full gas exchange is made unnecessary. The gas supply device and gas exhaust device are controlled so that the laser gas in the laser chamber is partially exchanged in a gas exchange quantity that maintains the quantity of impurities in the laser chamber at or below a fixed level. Also, the gas exchange quantity is obtained using the total quantity of output light energy reduction A, the total gas pressure in the laser chamber P, and output light energy reduction quantity per unit time k, for the case where partial gas exchange is repeated infinitely in the laser chamber.

A narrow-band discharge excited laser device including a laser chamber having a laser gas sealed therein, a pair of electrodes provided within the laser chamber to face each other with a predetermined distance therebetween, a band-narrowing module having a magnifying prism and a grating and receiving laser light passing through a slit, and a cross-flow fan circulating the laser gas passing between the electrodes, in which a pulsed voltage is applied from a high-voltage power supply to the pair of electrodes to generate electric discharge between the electrodes, and the pair of electrodes have a width of 1 to 2 mm, a ratio between the electrode width and the inter-electrode distance (electrode with inter-electrode distance) being 0.25 to 0.125.

The invention belongs to the technical field of excimer lasers and provides a device and a method for adjusting a ring cavity of an excimer laser device. The device comprises a reference light source, reflecting mirrors, a small-hole diaphragm and a screen, wherein the reference light source is used for producing reference light beams for calibration. The method is particularly applicable to a ring cavity adjustment reference light and excimer laser coaxial method. According to the method, a discharging chamber optical axis position can be determined with fluorescent light spot centers of a discharging chamber outside two sealing windows serving as references, and two reflecting mirrors inside the ring cavity are adjusted to enable reference light to circle the ring cavity by one circle and then coincide with a far point light spot at a near point with secondary reflection light of the reference light which just enters a coupling mirror, so that a cavity body of the ring cavity of the excimer laser device can be adjusted. According to the method and the device, limitations of traditional methods are broken through, the adjustment of the ring cavity is simplified into the adjustment of coincidence of two light beams outside the cavity, the adjustment precision is high, sealing windows are not required to be removed, additional measurement instruments are not required, and the operation is simple.

Apparatus for homogenizing and projecting two laser-beams is arranged such that the projected homogenized beams are aligned parallel to each other in a first transverse axis and partially overlap in second transverse axis perpendicular to the first transverse axis. The projected homogenized laser-beams have different intensities in the second axis and the degree of partial overlap is selected such that the combined intensity of the laser beams in the second axis has a step profile.

To provide an excimer laser device and method in which the frequency of full gas exchange within the laser chamber is reduced, and more preferably full gas exchange is made unnecessary.The gas supply device and gas exhaust device are controlled so that the laser gas in the laser chamber is partially exchanged in a gas exchange quantity that maintains the quantity of impurities in the laser chamber at or below a fixed level. Also, the gas exchange quantity is obtained using the total quantity of output light energy reduction A, the total gas pressure in the laser chamber P, and output light energy reduction quantity per unit time k, for the case where partial gas exchange is repeated infinitely in the laser chamber.

An excimer laser apparatus may include an optical resonator, a chamber including a pair of discharge electrodes, the chamber being provided in the optical resonator and configured to store laser gas, an electric power source configured to receive a trigger signal and apply a pulsed voltage to the pair of discharge electrodes based on the trigger signal, an energy monitor configured to measure pulse energy of a pulse laser beam outputted from the optical resonator, a unit for adjusting partial pressure of halogen gas configured to perform exhausting a part of the laser gas stored in the chamber and supplying laser gas to the chamber, and a controller configured to acquire measurement results of the pulse energy measured by the energy monitor, detect energy depression based on the measurement results of the pulse energy, and control the unit for adjusting partial pressure of halogen gas based on results of detecting the energy depression to adjust the partial pressure of halogen gas in the chamber.

This laser gas purifying system purifies an exhaust gas discharged from an ArF excimer laser device that uses a laser gas containing xenon gas, and supplies the purified gas to the ArF excimer laser device. The laser gas purifying system may be provided with: a xenon trap for reducing the xenon gas concentration of the exhaust gas; and a xenon adding device for adding xenon gas to the exhaust gasthat has passed through the xenon trap.

The invention provides a novel method for preparing a chirped optical fiber bragg grating by means of a uniform grating mask plate. The novel method is suitable for preparing chirped optical fiber bragg grating of an optical fiber with a fiber core having large-range transverse refractive index change. The method is characterized in that an excimer laser device, a reflector, a beam expander, a cylindrical lens, a mask plate and a single-stress-element optical fiber are sequentially placed in an inscribing light path, a fiber core is parallel to the mask plate and perpendicular to the grid lineof the mask plate, and the chirped optical fiber bragg grating can be obtained through the process of inscribing the uniform optical fiber bragg grating. According to the invention, the chirped optical fiber Bragg grating with different spectral characteristics can be prepared only by using the same phase mask plate by using optical fibers with different fiber core refractive indexes and large-range transverse change; and the method can be used for preparing the chirped optical fiber bragg grating and can be widely applied to the technical field of optical fiber devices.

A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.

This excimer laser device comprises an etalon spectrometer for measuring a fringe waveform from laser light and a controller which determines the surface area of a first proportion of spectral space obtained on the basis of measurement results from the etalon spectrometer and calculates a first spectral line width of the laser light on the basis of the determined surface area of the first proportion, and the controller further calibrates the first spectral line width on the basis of a correlation function indicating a correlation between the first spectral line width and a second spectral linewidth of the laser light measured by a reference measurement apparatus.

The invention discloses a double-cavity excimer laser device complete-device frame system. A double-cavity excimer laser device comprises a main oscillation discharging cavity, a power amplification cavity and an optical system relevant to the two cavities. The double-cavity excimer laser device complete-device frame system comprises an installation base (1), a foundational frame (2), an optical system frame (3) and a discharging cavity frame (4), wherein the installation base (1) is a base of the complete-device frame system and used for bearing all components of the complete-device frame system, the foundational frame (2) is directly and fixedly installed on the installation base (1), the optical system frame (3) is used for installation of the optical system and separated from the discharging cavity frame (4), and the discharging cavity frame (4) is installed on the installation base (1) and used for bearing the main oscillation discharging cavity and the power amplification cavity. The double-cavity excimer laser device complete-device frame system can reduce influences of the discharging cavity on the optical system.

An excimer laser annealing device and a method for using same. The device comprises a substrate stage (10) and an excimer laser device (20); the substrate stage (10) comprises a bearing surface (15) for bearing a substrate (11) having an amorphous silicon film (13), and a temperature adjusting module (14); the temperature adjusting module (14) is used for adjusting the temperature on the carrying surface (15) to control the direction of crystallization of the amorphous silicon in the amorphous silicon film (13). The direction of recrystallization of the amorphous silicon is controlled by adding a temperature adjusting module (14).

The invention discloses a discharging chamber with a micro-channel structure and a gas laser device. The discharging chamber is internally provided with a discharging electrode and a draught fan; and the draught fan drives gas in the discharging chamber to flow through the discharging electrode, so as to form a main gas flow. Flow guide plates are arranged at the two sides of the discharging electrode and a micro-channel is arranged on each flow guide plate; and an outlet of the micro-channel faces to a gap between each flow guide plate and the discharging electrode. The discharging chamber further comprises a pre-ionizing device and is supported among the flow guide plates and the discharging electrode. According to the discharging chamber with the micro-channel structure and the gas laser device, the micro-channel structure is formed in the discharging chamber of an excimer laser device, thereby preventing the generation of a vortex air flow, reducing an arc phenomenon generated on the side face of the discharging electrode, increasing the discharging stability, improving the laser energy and prolonging the service life of a pre-ionizing electrode.