43 results about "Excimer laser device" patented technology

To provide an excimer laser device and method in which the frequency of full gas exchange within the laser chamber is reduced, and more preferably full gas exchange is made unnecessary. The gas supply device and gas exhaust device are controlled so that the laser gas in the laser chamber is partially exchanged in a gas exchange quantity that maintains the quantity of impurities in the laser chamber at or below a fixed level. Also, the gas exchange quantity is obtained using the total quantity of output light energy reduction A, the total gas pressure in the laser chamber P, and output light energy reduction quantity per unit time k, for the case where partial gas exchange is repeated infinitely in the laser chamber.

Apparatus for homogenizing and projecting two laser-beams is arranged such that the projected homogenized beams are aligned parallel to each other in a first transverse axis and partially overlap in second transverse axis perpendicular to the first transverse axis. The projected homogenized laser-beams have different intensities in the second axis and the degree of partial overlap is selected such that the combined intensity of the laser beams in the second axis has a step profile.

A narrow-band discharge excited laser device including a laser chamber having a laser gas sealed therein, a pair of electrodes provided within the laser chamber to face each other with a predetermined distance therebetween, a band-narrowing module having a magnifying prism and a grating and receiving laser light passing through a slit, and a cross-flow fan circulating the laser gas passing between the electrodes, in which a pulsed voltage is applied from a high-voltage power supply to the pair of electrodes to generate electric discharge between the electrodes, and the pair of electrodes have a width of 1 to 2 mm, a ratio between the electrode width and the inter-electrode distance (electrode with inter-electrode distance) being 0.25 to 0.125.

The invention belongs to the technical field of excimer lasers and provides a device and a method for adjusting a ring cavity of an excimer laser device. The device comprises a reference light source, reflecting mirrors, a small-hole diaphragm and a screen, wherein the reference light source is used for producing reference light beams for calibration. The method is particularly applicable to a ring cavity adjustment reference light and excimer laser coaxial method. According to the method, a discharging chamber optical axis position can be determined with fluorescent light spot centers of a discharging chamber outside two sealing windows serving as references, and two reflecting mirrors inside the ring cavity are adjusted to enable reference light to circle the ring cavity by one circle and then coincide with a far point light spot at a near point with secondary reflection light of the reference light which just enters a coupling mirror, so that a cavity body of the ring cavity of the excimer laser device can be adjusted. According to the method and the device, limitations of traditional methods are broken through, the adjustment of the ring cavity is simplified into the adjustment of coincidence of two light beams outside the cavity, the adjustment precision is high, sealing windows are not required to be removed, additional measurement instruments are not required, and the operation is simple.

The invention provides an excimer laser annealing device and a using method thereof. The device comprises a substrate loading table and an excimer laser device used for emitting excimer laser beams to a substrate. The substrate loading table comprises a loading surface used for loading the substrate with an amorphous silicon film, and a temperature adjusting module; the temperature adjusting module is used for adjusting the temperature of the loading surface and controlling the crystallization direction of amorphous silicon of the amorphous silicon film. According to the excimer laser annealing device and the using method thereof, the temperature adjusting module is arranged on the substrate table, a region with temperature gradients is formed, the amorphous silicon is recrystallized in the temperature adjusting direction, polysilicon with larger grain sizes is obtained, and the effect of a liquid crystal display is improved.

The invention provides a seed injection ArF excimer laser device. The device comprises an all solid state seed laser and an ArF excimer laser, wherein the all solid state seed laser comprises an all solid state laser, a nonlinear optical crystal converter and a KBe2BO3F2 crystal frequency multiplier; the all solid state laser is used for generating basic frequency laser; the nonlinear optical crystal converter is used for receiving the basic frequency laser and performing frequency conversion on the basic frequency laser until the wavelength is 386.8 nanometers; the KBe2BO3F2 crystal frequency multiplier is used for receiving laser of 386.8 nanometers and performing frequency multiplication on the laser until the laser becomes seed laser with the wavelength of 193.4 nanometers; the all solid state seed laser injects the seed laser into the ArF excimer laser; and the ArF excimer laser receives and amplifies the seed laser. The seed injection ArF excimer laser device of the invention has the advantages of simple structure, easier practicability and engineering and capability of realizing 193.4-nanometer output of laser with high power, high light beam quality and small line width.

To provide an excimer laser device and method in which the frequency of full gas exchange within the laser chamber is reduced, and more preferably full gas exchange is made unnecessary.The gas supply device and gas exhaust device are controlled so that the laser gas in the laser chamber is partially exchanged in a gas exchange quantity that maintains the quantity of impurities in the laser chamber at or below a fixed level. Also, the gas exchange quantity is obtained using the total quantity of output light energy reduction A, the total gas pressure in the laser chamber P, and output light energy reduction quantity per unit time k, for the case where partial gas exchange is repeated infinitely in the laser chamber.

The invention discloses a method for improving flexible AZO (aluminum doped zinc oxide) film photoelectric property by an excimer laser. The method utilizes an excimer laser device to perform laser annealing for an aluminum doped zinc oxide (for short AZO) film, and thereby improving the photoelectric property of the AZO film. The method comprises the steps as follows: firstly, methods such as pulsed laser deposition and the like are utilized to generate a layer of AZO film on a flexible substrate, and then an excimer laser annealing device is used to anneal the film. The method for improving the flexible AZO film photoelectric property by the excimer laser is characterized in that high power pulse laser beams are irradiated on the AZO film, the inner film surface reaches very high temperature in an extremely short time, and the flexible substrate material is not damaged, accordingly, the crystalline degree of the film is improved, and the electrical resistivity of the film is substantially reduced, so that the photoelectric property of the film is improved.

The invention discloses a thermostatic control system suitable for an excimer laser device. The system comprises a main circuit and a branch circuit and further comprises a solenoid valve, a first flow sensor, a diverter and a collector which are arranged on the main circuit, and a first proportioning valve, a second proportioning valve, a second flow sensor, a third flow sensor, an automatic temperature control chamber and a first non-return valve which are arranged on the branch circuit, a lower computer and an industrial control computer communicating with the lower computer, wherein the industrial control computer is used for sending an instruction to control repetition frequency of the excimer laser device and transmitting the repetition frequency information to the lower computer through an RS485 protocol, and the lower computer is used for correspondingly controlling flows of the first proportioning valve and the second proportioning valve according to the repetition frequency information and further taking the repetition frequency as former feedback to automatically control the temperature of the automatic temperature control chamber to stay at a target level.

The invention discloses a discharging chamber with a micro-channel structure and a gas laser device. The discharging chamber is internally provided with a discharging electrode and a draught fan; and the draught fan drives gas in the discharging chamber to flow through the discharging electrode, so as to form a main gas flow. Flow guide plates are arranged at the two sides of the discharging electrode and a micro-channel is arranged on each flow guide plate; and an outlet of the micro-channel faces to a gap between each flow guide plate and the discharging electrode. The discharging chamber further comprises a pre-ionizing device and is supported among the flow guide plates and the discharging electrode. According to the discharging chamber with the micro-channel structure and the gas laser device, the micro-channel structure is formed in the discharging chamber of an excimer laser device, thereby preventing the generation of a vortex air flow, reducing an arc phenomenon generated on the side face of the discharging electrode, increasing the discharging stability, improving the laser energy and prolonging the service life of a pre-ionizing electrode.

The invention discloses a dual wavelength antireflection film for excimer laser and an optical film thickness monitoring system that are applied to an excimer laser device compatible with 193 nm and 248 nm deep ultraviolet. The dual wavelength antireflection film for the excimer laser comprises a substrate and a multilayer film arranged on the substrate, wherein the multilayer film is formed by alternating stacking high refractive index films and low refractive index films, each high refractive index film is made of lanthanum fluoride, each low refractive index film is made of magnesium fluoride, and the multilayer film has 4 to 10 layers. The optical film thickness monitoring system comprises an electron-beam evaporation source, a thermal resistance evaporation source and a plated substrate; a baffle plate is arranged between the electron-beam evaporation source as well as the thermal resistance evaporation source and a plated substrate. The dual wavelength antireflection film applied to deep ultraviolet excimer laser ranges from 193 nm to 248 nm and is very low in residual reflectivity of a substrate surface, and minimum absorbing and scattering loss can be realized.

An excimer laser apparatus may include an optical resonator, a chamber including a pair of discharge electrodes, the chamber being provided in the optical resonator and configured to store laser gas, an electric power source configured to receive a trigger signal and apply a pulsed voltage to the pair of discharge electrodes based on the trigger signal, an energy monitor configured to measure pulse energy of a pulse laser beam outputted from the optical resonator, a unit for adjusting partial pressure of halogen gas configured to perform exhausting a part of the laser gas stored in the chamber and supplying laser gas to the chamber, and a controller configured to acquire measurement results of the pulse energy measured by the energy monitor, detect energy depression based on the measurement results of the pulse energy, and control the unit for adjusting partial pressure of halogen gas based on results of detecting the energy depression to adjust the partial pressure of halogen gas in the chamber.

An excimer laser device capable of suppressing deterioration of optical elements provided in a laser chamber even if output energy per pulse is increased more than the conventional level, in which a width of a laser beam applied to the optical elements provided in the laser chamber is enlarged so as to reduce the energy density of the laser beam within such a range that a laser output of no less than a desired level is obtained.

Burst and spike characteristics in an excimer laser output in a burst operation are efficiently improved. Xenon gas is added from a compact Xe gas cylinder to gases for excimer laser in a chamber supplied from an Ar / Ne gas cylinder and an Ar / F2 / Ne gas cylinder, a ratio of the xenon gas is detected by an Xe gas sensor, and the supply of the xenon gas from the Xe gas cylinder to the chamber is controlled by a gas controller.

This laser gas purifying system purifies an exhaust gas discharged from an ArF excimer laser device that uses a laser gas containing xenon gas, and supplies the purified gas to the ArF excimer laser device. The laser gas purifying system may be provided with: a xenon trap for reducing the xenon gas concentration of the exhaust gas; and a xenon adding device for adding xenon gas to the exhaust gasthat has passed through the xenon trap.

An excimer laser device is provided with: an optical resonator; a chamber positioned in the optical resonator, the chamber including a pair of discharge electrodes and accommodating a laser gas; a power supply for receiving a trigger signal and applying a pulsed voltage to the pair of discharge electrodes on the basis of the trigger signal; an energy monitor for measuring the pulse energy of pulsed laser light outputted from the optical resonator; a halogen gas partial pressure regulation unit configured so as to be capable of exhausting some of the laser gas accommodated in the chamber and supplying the laser gas into the chamber; and a control unit for acquiring the result of the pulse energy measurements performed by the energy monitor, detecting an energy dip on the basis of the pulseenergy measurement result, and controlling the halogen gas partial pressure regulation unit on the basis of the result of detecting an energy dip, whereby the halogen gas partial pressure in the chamber is adjusted.

The invention relates to the technical field of laser washing, and discloses an excimer laser intelligent washing equipment by using the excimer laser as a washing light source. The equipment is composed of an excimer laser device, an optical system, a controlling system and a workbench. According to the excimer laser intelligent washing equipment, the ultraviolet band laser output by the excimerlaser device is shaped by the optical system, then transmitted and irradiated to the surface part of the workpiece needing to be washed, the washed substance is eliminated by means of the physical andchemical effects of the washed substance on the surface of the workpiece through the ultraviolet laser, and the purpose of washing the workpiece is achieved; and the excimer laser intelligent washingequipment has the characteristics of being without grinding and contacting, high in laser energy density, small in thermal effect and the like, meanwhile, the ultraviolet wavelength laser can effectively wash the special materials such as the impurities and the pollution which cannot be washed by other wavelength laser and is efficient, high-quality and high-targeted washing equipment.

A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.

The invention discloses a high-stability excimer laser device which comprises a discharge resonant cavity, a line width narrowing module, a detection module and a control module, wherein the line width narrowing module comprises a beam expanding device and an echelle grating which are sequentially arranged in the laser emitting direction of the first side of the discharge resonant cavity; the detection module comprises a central wavelength accurate measurement device and a central wavelength rough measurement device; the central wavelength rough measurement device comprises a reflection device, a light beam convergence device and a first photoelectric detection device, and is used for performing central wavelength rough measurement; the central wavelength accurate measurement device is arranged on a second side, which is opposite to the first side, of the discharge resonant cavity and is used for receiving a laser beam emitted from the second side and performing central wavelength accurate measurement; and the control module is respectively connected with the discharge resonant cavity, the central wavelength accurate measurement device and the central wavelength rough measurement device, and is used for adjusting parameters in the discharge resonant cavity according to measurement results of the central wavelength accurate measurement device and the central wavelength rough measurement device.

The invention discloses a visible light guiding device for an excimer laser device. The excimer laser device comprises a MO cavity, a PA cavity and a PA cavity light path transposing unit. The PA cavity light path transposing unit is used for guiding seed light output by the MO cavity to enter the PA cavity for amplification and simultaneously transmitting an output laser from the PA cavity. The visible light guiding device comprises a visible light laser device and a visible light path transposing unit. The visible light laser device is used for generating a laser in the visible light wave band. The visible light path transposing unit is used for guiding the laser in the visible light wave band generated by the visible light laser device to be output coaxially with the laser from the PA cavity. According to the invention, the following effective alignment between the optical components and the excimer laser device can be accomplished based on referencing the visible light path, the alignment precision is improved, and the negative influences such as a large damage to an operator are avoided effectively.

The invention provides a novel method for preparing a chirped optical fiber bragg grating by means of a uniform grating mask plate. The novel method is suitable for preparing chirped optical fiber bragg grating of an optical fiber with a fiber core having large-range transverse refractive index change. The method is characterized in that an excimer laser device, a reflector, a beam expander, a cylindrical lens, a mask plate and a single-stress-element optical fiber are sequentially placed in an inscribing light path, a fiber core is parallel to the mask plate and perpendicular to the grid lineof the mask plate, and the chirped optical fiber bragg grating can be obtained through the process of inscribing the uniform optical fiber bragg grating. According to the invention, the chirped optical fiber Bragg grating with different spectral characteristics can be prepared only by using the same phase mask plate by using optical fibers with different fiber core refractive indexes and large-range transverse change; and the method can be used for preparing the chirped optical fiber bragg grating and can be widely applied to the technical field of optical fiber devices.

The invention discloses an excimer laser device for treating leucoderma. The excimer laser device comprises a sidesway transmission mechanism, wherein a sidesway mechanism is arranged at the top of the sidesway transmission mechanism; a power output mechanism is arranged on the rear side of the sidesway transmission mechanism; and an excimer laser treating device is rotatably connected to the topof the sidesway mechanism through an angle regulating mechanism. According to the excimer laser device disclosed by the invention, the angle regulating mechanism is arranged, so that an illumination angle of the excimer laser treating device can be rotatably adjusted, and an adjusting angle range can cover all the body of a patient; under the cooperation usage of the sidesway transmission mechanism, the sidesway mechanism and the power output mechanism, the excimer laser treating device can conduct front-and-back reciprocating movement, so that the excimer laser device can cover the whole bodyof the patient, and the treatment requirement of the patient is met to the maximum extent. The excimer laser device for treating leucoderma disclosed by the invention has the advantages that labor operation is reduced, the working strength is reduced, the treating efficiency is improved, and the user can conveniently use the device.

A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.

The invention discloses a double-cavity excimer laser device complete-device frame system. A double-cavity excimer laser device comprises a main oscillation discharging cavity, a power amplification cavity and an optical system relevant to the two cavities. The double-cavity excimer laser device complete-device frame system comprises an installation base (1), a foundational frame (2), an optical system frame (3) and a discharging cavity frame (4), wherein the installation base (1) is a base of the complete-device frame system and used for bearing all components of the complete-device frame system, the foundational frame (2) is directly and fixedly installed on the installation base (1), the optical system frame (3) is used for installation of the optical system and separated from the discharging cavity frame (4), and the discharging cavity frame (4) is installed on the installation base (1) and used for bearing the main oscillation discharging cavity and the power amplification cavity. The double-cavity excimer laser device complete-device frame system can reduce influences of the discharging cavity on the optical system.

An excimer laser technology for precisely machining the axially-symmetrical miniature part includes such steps as fixing a workpiece to a movable bench via axle regulator and rotary bench, coinciding the rotary axis of workpiece with that of rotary bench, starting excimer laser device to make the laser beams be focused the tangent point of the position to be machined, and rotating the rotary bench while moving the movable bench by computer to each the excess material on workpiece. Its advantages are high surface finish quality and high precision.

The invention discloses a double-cavity excimer laser device complete-device frame system. A double-cavity excimer laser device comprises a main oscillation discharging cavity, a power amplification cavity and an optical system relevant to the two cavities. The double-cavity excimer laser device complete-device frame system comprises an installation base (1), a foundational frame (2), an optical system frame (3) and a discharging cavity frame (4), wherein the installation base (1) is a base of the complete-device frame system and used for bearing all components of the complete-device frame system, the foundational frame (2) is directly and fixedly installed on the installation base (1), the optical system frame (3) is used for installation of the optical system and separated from the discharging cavity frame (4), and the discharging cavity frame (4) is installed on the installation base (1) and used for bearing the main oscillation discharging cavity and the power amplification cavity. The double-cavity excimer laser device complete-device frame system can reduce influences of the discharging cavity on the optical system.

An excimer laser annealing device and a method for using same. The device comprises a substrate stage (10) and an excimer laser device (20); the substrate stage (10) comprises a bearing surface (15) for bearing a substrate (11) having an amorphous silicon film (13), and a temperature adjusting module (14); the temperature adjusting module (14) is used for adjusting the temperature on the carrying surface (15) to control the direction of crystallization of the amorphous silicon in the amorphous silicon film (13). The direction of recrystallization of the amorphous silicon is controlled by adding a temperature adjusting module (14).

The invention discloses a discharging chamber with a micro-channel structure and a gas laser device. The discharging chamber is internally provided with a discharging electrode and a draught fan; and the draught fan drives gas in the discharging chamber to flow through the discharging electrode, so as to form a main gas flow. Flow guide plates are arranged at the two sides of the discharging electrode and a micro-channel is arranged on each flow guide plate; and an outlet of the micro-channel faces to a gap between each flow guide plate and the discharging electrode. The discharging chamber further comprises a pre-ionizing device and is supported among the flow guide plates and the discharging electrode. According to the discharging chamber with the micro-channel structure and the gas laser device, the micro-channel structure is formed in the discharging chamber of an excimer laser device, thereby preventing the generation of a vortex air flow, reducing an arc phenomenon generated on the side face of the discharging electrode, increasing the discharging stability, improving the laser energy and prolonging the service life of a pre-ionizing electrode.