Visible light guiding device for excimer laser device

Abstract

The invention discloses a visible light guiding device for an excimer laser device. The excimer laser device comprises a MO cavity, a PA cavity and a PA cavity light path transposing unit. The PA cavity light path transposing unit is used for guiding seed light output by the MO cavity to enter the PA cavity for amplification and simultaneously transmitting an output laser from the PA cavity. The visible light guiding device comprises a visible light laser device and a visible light path transposing unit. The visible light laser device is used for generating a laser in the visible light wave band. The visible light path transposing unit is used for guiding the laser in the visible light wave band generated by the visible light laser device to be output coaxially with the laser from the PA cavity. According to the invention, the following effective alignment between the optical components and the excimer laser device can be accomplished based on referencing the visible light path, the alignment precision is improved, and the negative influences such as a large damage to an operator are avoided effectively.

Description

technical field [0001] The invention belongs to the technical field of lasers, and in particular relates to a visible light guiding device of an excimer laser. Background technique [0002] Excimer lasers are currently the mainstream exposure light source used in large-scale integrated circuit chip manufacturing. 193nm high-energy, narrow-linewidth excimer lasers are excimer lasers widely used in production lines for lithography. [0003] figure 1 It is a schematic diagram of the basic structure of a 193nm excimer laser for lithography, mainly including a seed cavity (MO cavity), an amplifying cavity (PA cavity), a line width narrowing unit 1 (LNM), an output coupling mirror 2 (OC), and an MO cavity online detection Unit 3 (LAM), MO cavity optical path transposition unit 4, PA cavity optical path transposition unit 5, PA cavity optical path inversion unit 6, PA cavity online detection unit 7 (BAM), pulse stretching unit 8 (OPus), etc. The MO cavity and the PA cavity are a...

AI Technical Summary

Problems solved by technology

Therefore, based on the 193nm laser output by the 193nm excimer laser to complete the alignment process between a series of optical components such as the subsequent optical path conversion system and the excimer laser, there will be certain difficulties, difficult to distinguish, and it is not conducive to observing the subsequent optical components and the excimer laser. Whether effective high-precision alignment is achieved

At the same time, the 193nm laser will cause cold burns on the contact objects and cause ablation effect, so there is a certain danger to the personal safety of operators

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