High-stability excimer laser device

Abstract

The invention discloses a high-stability excimer laser device which comprises a discharge resonant cavity, a line width narrowing module, a detection module and a control module, wherein the line width narrowing module comprises a beam expanding device and an echelle grating which are sequentially arranged in the laser emitting direction of the first side of the discharge resonant cavity; the detection module comprises a central wavelength accurate measurement device and a central wavelength rough measurement device; the central wavelength rough measurement device comprises a reflection device, a light beam convergence device and a first photoelectric detection device, and is used for performing central wavelength rough measurement; the central wavelength accurate measurement device is arranged on a second side, which is opposite to the first side, of the discharge resonant cavity and is used for receiving a laser beam emitted from the second side and performing central wavelength accurate measurement; and the control module is respectively connected with the discharge resonant cavity, the central wavelength accurate measurement device and the central wavelength rough measurement device, and is used for adjusting parameters in the discharge resonant cavity according to measurement results of the central wavelength accurate measurement device and the central wavelength rough measurement device.

Description

Technical field [0001] The present application relates to the field of lasers, particularly, to a high stability of the excimer laser apparatus. Background technique [0002] Excimer laser having a laser output due to wave length, line width, high energy characteristics, are widely used in semiconductor chip processing, such as: laser output excimer laser lithography is the most common source machine. [0003] With the development of chip processing technology, the chip size requirements have reached the 28nm, 14nm or even smaller. Accordingly, increasingly high requirements for excimer laser processing chip. Not only higher energy laser can be released and have a narrower spectrum, also we need to have a higher stability of the laser center wavelength during operation. And the energy of the excimer laser line measurement center wavelength, the center wavelength and energy closed loop feedback control means and a higher requirement. [0004] In patent US6539046 and US6317448, pre...

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Problems solved by technology

[0004] In the patents US6539046 and US6317448, the central wavelength measurement method using FP etalon and grating was proposed. The FP standard has extremely high wavelength sensitivity, but the measurement range is relatively small, which cannot meet the needs of full-scale measurement of excimer lasers. Therefore, , it is necessary to use the grating method to roughly measure the central wavelength first, and then use the FP etalon for precise measurement to achieve a wide range and high-precision measurement of the central wavelength

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