A Low-Loss Optical Waveguide Phase Shifter Based on High-mobility TCO Thin Films
A high-mobility, optical waveguide technology, applied in the field of integrated optics, can solve the problems of weak coefficient, unfavorable large-scale integration process, and large device size.
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[0024] The present invention will be further described below with reference to the drawings and embodiments.
[0025] Structure like figure 2 The shown low-loss optical waveguide phase shifter based on high-mobility TCO film uses low-index SiO 2 As a substrate, the center working wavelength is 1550nm.
[0026] The device can be obtained through the following microfabrication methods:
[0027] Step 1. Using plasma enhanced chemical vapor deposition (PECVD) method to deposit a layer of 250nm low-loss polysilicon on a silicon dioxide substrate.
[0028] Step 2. Photolithography and etching of the substrate obtained in Step 1 obtain a silicon waveguide structure with a width of 180 nm and a depth of 220 nm.
[0029] Step 3. Open a 2um wide window on the waveguide obtained in step 2, and use laser pulse PLD technology to grow a layer of 5nm hafnium dioxide HfO 2 .
[0030] Step 4. Use the laser pulse PLD technique to deposit a 10nm cadmium oxide CdO film on the sample obtained in step 3.
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