Low-loss optical waveguide phase shifter based on high-mobility TCO thin film
A high-mobility, optical waveguide technology, applied in the field of integrated optics, can solve the problems of weak coefficient, large device size, unfavorable large-scale integration process, etc., and achieve the effect of convenient preparation
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[0024] The present invention will be further elaborated below in conjunction with the accompanying drawings and embodiments.
[0025] structured as figure 2 The shown low-loss optical waveguide phase shifter based on high-mobility TCO film, using low-index SiO 2 As a substrate, the central working wavelength is 1550nm.
[0026] Devices can be obtained by the following microfabrication methods:
[0027] Step 1. Deposit a layer of 250nm low-loss polysilicon on the silicon dioxide substrate by plasma enhanced chemical vapor deposition (PECVD).
[0028] Step 2, photolithography and etching the substrate obtained in step 1 to obtain a silicon waveguide structure with a width of 180 nm and a depth of 220 nm.
[0029] Step 3. Open a window with a width of 2um on the waveguide obtained in step 2, and grow a layer of 5nm hafnium dioxide HfO by laser pulse PLD technology 2 .
[0030] Step 4. Continue to deposit a layer of 10nm cadmium oxide CdO film on the sample obtained in step ...
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