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A power diode device

A power diode and device technology, applied in the field of power diode device structure, can solve the problems of low reverse withstand voltage, low reliability of gate oxide layer, poor reliability of Schottky junction at high temperature, etc.

Active Publication Date: 2021-02-12
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] Aiming at the problems of poor high-temperature reliability of Schottky junction, low reliability of gate oxide layer, large reverse leakage and low reverse withstand voltage of the above-mentioned traditional Schottky barrier diodes, the present invention proposes a power diode device and its fabrication method, the forward current level of the device is improved by forming a heterojunction between the first polysilicon 2 and the N-semiconductor drift region 4; the P+ semiconductor protective layer 7 at the bottom of the first polysilicon 2 is connected with the device when the device is reversely blocked. The depletion region formed by the N-semiconductor drift region 4 just cuts off the conductive channel and terminates the electric force line from the N-semiconductor drift region 4, thereby protecting structures such as trench gates and Schottky junction contacts, and improving device voltage blocking ability, improving the reliability of the gate oxide layer;

Method used

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Embodiment 1

[0077]This embodiment takes the structure of a 1200V silicon carbide power diode device as an example. The schematic diagram of the power diode device cell is as follows:figure 2 As shown, it includes a cathode metal 6, an N+ semiconductor substrate 5, and an N-semiconductor drift region 4 arranged in sequence from bottom to top. It is characterized in that the top layer of the N-semiconductor drift region 4 has a trench structure symmetrically arranged on both sides of the trench structure. It includes the P+ semiconductor protective layer 7 and the first polysilicon 2 arranged from the bottom up, and the anode metal 1 is arranged on the upper surface of the N-semiconductor drift region 4 between the trench structure and the trench structure; in this embodiment, P+ silicon carbide The protective layer 7 is short-circuited with the anode metal 1, and the P+ silicon carbide protective layer 7 can also be short-circuited with the ground or floating; a dielectric layer 3 is provided at...

Embodiment 2

[0081]This embodiment is modified to a certain extent with respect to embodiment 1. Its structure is roughly the same as that of embodiment 2, except that the P+ silicon carbide protective layers 7 on both sides extend to the other side, so that the P+ silicon carbide protective layer 7The horizontal width is made larger, the width is 0.4~0.7μm, such asFigure 7 Shown. The greater the lateral width of the protective layer 7 in the P+ silicon carbide region, the stronger the electric field shielding effect on the area above the protective layer 7 of P+ silicon carbide when the device is in the blocking state, that is, it protects the Si / SiC heterojunction, MIS structure and Schottky junction structure. While protecting the above structure, the withstand voltage of the device is also improved. However, it should be noted that the wider the width of the P+ silicon carbide protective layer 7 is, the greater the on-resistance of the device during forward operation. Therefore, the width of...

Embodiment 3

[0083]This embodiment makes a certain degree of modification for Embodiment 1 and Embodiment 2. Its structure is roughly the same as that of Embodiment 2, except that the improved structure does not include the dielectric layer 3, that is, the first polysilicon 2 and N- The silicon carbide drift region 4 completely forms a Si / SiC heterojunction structure on the sidewall contact surface of the first trench and the second trench. The improvement of this structure further increases the branch current level in the on-state of the device, and optimizes the forward performance of the device, such asFigure 8 Shown.

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Abstract

A power diode device belongs to the field of semiconductor power devices. Its cell structure includes cathode metal, N+ semiconductor substrate and N-semiconductor drift region arranged in sequence from bottom to top, and trench structures are symmetrically arranged on both sides of the top layer of N-semiconductor drift region. The trench structure includes bottom-up arrangement P+ semiconductor protection layer and polysilicon, anode metal is set on the upper surface of the N-semiconductor drift region between the trench structure and the trench structure; the cathode metal forms an ohmic contact with the N+ semiconductor substrate, the anode metal forms an ohmic contact with the polysilicon gate, and the anode metal A Schottky contact is formed with the N-semiconductor drift region, and a polysilicon gate forms a heterojunction with the N-semiconductor drift region. The invention has the characteristics of high forward current density, high reverse withstand voltage capability and low reverse leakage.

Description

Technical field[0001]The invention belongs to the field of power semiconductor device technology, and specifically relates to a power diode device structure.Background technique[0002]The development and efficient use of energy resources are the eternal theme of human development. Since human history entered the 21st century, the world's energy production and consumption have still been dominated by fossil energy. Considering the current development and utilization of energy resources, fossil energy will still be the energy basis for human survival and development for a long time. However, fossil energy will eventually be exhausted, and it is easy to cause environmental pollution. The resulting environmental and sustainable development issues are problems that mankind must face. Electricity is one of the main forms of human available energy, and the improvement of its use efficiency is an important solution to the world's energy problems. The power system is a necessary way for human...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/872H01L29/06H01L21/331
CPCH01L29/0607H01L29/66143H01L29/8725
Inventor 张金平邹华赵阳罗君轶刘竞秀李泽宏张波
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA