A power diode device
A power diode and device technology, applied in the field of power diode device structure, can solve the problems of low reverse withstand voltage, low reliability of gate oxide layer, poor reliability of Schottky junction at high temperature, etc.
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Embodiment 1
[0077]This embodiment takes the structure of a 1200V silicon carbide power diode device as an example. The schematic diagram of the power diode device cell is as follows:figure 2 As shown, it includes a cathode metal 6, an N+ semiconductor substrate 5, and an N-semiconductor drift region 4 arranged in sequence from bottom to top. It is characterized in that the top layer of the N-semiconductor drift region 4 has a trench structure symmetrically arranged on both sides of the trench structure. It includes the P+ semiconductor protective layer 7 and the first polysilicon 2 arranged from the bottom up, and the anode metal 1 is arranged on the upper surface of the N-semiconductor drift region 4 between the trench structure and the trench structure; in this embodiment, P+ silicon carbide The protective layer 7 is short-circuited with the anode metal 1, and the P+ silicon carbide protective layer 7 can also be short-circuited with the ground or floating; a dielectric layer 3 is provided at...
Embodiment 2
[0081]This embodiment is modified to a certain extent with respect to embodiment 1. Its structure is roughly the same as that of embodiment 2, except that the P+ silicon carbide protective layers 7 on both sides extend to the other side, so that the P+ silicon carbide protective layer 7The horizontal width is made larger, the width is 0.4~0.7μm, such asFigure 7 Shown. The greater the lateral width of the protective layer 7 in the P+ silicon carbide region, the stronger the electric field shielding effect on the area above the protective layer 7 of P+ silicon carbide when the device is in the blocking state, that is, it protects the Si / SiC heterojunction, MIS structure and Schottky junction structure. While protecting the above structure, the withstand voltage of the device is also improved. However, it should be noted that the wider the width of the P+ silicon carbide protective layer 7 is, the greater the on-resistance of the device during forward operation. Therefore, the width of...
Embodiment 3
[0083]This embodiment makes a certain degree of modification for Embodiment 1 and Embodiment 2. Its structure is roughly the same as that of Embodiment 2, except that the improved structure does not include the dielectric layer 3, that is, the first polysilicon 2 and N- The silicon carbide drift region 4 completely forms a Si / SiC heterojunction structure on the sidewall contact surface of the first trench and the second trench. The improvement of this structure further increases the branch current level in the on-state of the device, and optimizes the forward performance of the device, such asFigure 8 Shown.
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Abstract
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