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RF return strap shielding cover

A technology of shielding cover and strip, applied in local shielding, coating, gaseous chemical plating, etc., can solve the problems of reducing the service life of chamber components and reducing the cleaning time interval of the chamber.

Active Publication Date: 2018-12-21
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Parasitic plasmas can contribute to undesired deposition under substrate support components, which can later become a source of contamination and undesirably reduce chamber cleaning intervals, and can also be attacked by plasma-induced erosion and arcing chamber parts, thereby reducing the service life of chamber parts

Method used

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  • RF return strap shielding cover
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Examples

Experimental program
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Embodiment Construction

[0015] figure 1 A cross-sectional view of a processing chamber 100 having a substrate support assembly 118 provided with a shielding cover 150 is shown, according to one embodiment. The shielding cover 150 serves to reduce the probability of arcing within the processing chamber and to inhibit the formation of a plasma beneath the substrate support assembly 118 within the processing chamber 100 .

[0016] The processing chamber 100 includes a chamber body 102 having sidewalls 104 , a bottom 106 and a showerhead 108 that define a processing volume 110 . The processing volume 110 is accessed through a slit valve opening 109 formed through the sidewall 104 to allow entry and exit of substrates 101 that are processed within the processing volume 110 when disposed on a substrate support assembly 118 .

[0017] Showerhead 108 is coupled to backplate 112 . For example, the showerhead 108 may be coupled to the backplate 112 by a suspension 114 at the perimeter of the backplate 112 . ...

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PUM

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Abstract

Embodiments described herein generally relate to a substrate support assembly having a shield cover. In one embodiment, a substrate support assembly is disclosed herein. The substrate support assemblyincludes a support plate, a plurality of RF return straps, at least one shield cover, and a stem. The support plate is configured to support a substrate. The plurality of RF return straps are coupledto a bottom surface of the support plate. At least one shield cover is coupled to the bottom surface of the support plate, between the plurality of RF return straps and the bottom surface. The stem is coupled to the support plate.

Description

technical field [0001] Embodiments described herein relate generally to substrate support assemblies, and more particularly, to substrate support assemblies having at least one shielding cover configured to prevent plasma arcing. Background technique [0002] Flat panel displays (FPDs) are commonly used in active matrix displays, such as computer and television monitors, personal digital assistants (PDAs) and cell phones, and solar cells, among others. Plasma enhanced chemical vapor deposition (PECVD) can be used in flat panel display manufacturing to deposit thin films on substrates supported on a substrate support assembly within a vacuum processing chamber. PECVD is generally accomplished by energizing a precursor gas into a plasma within a vacuum processing chamber and depositing a film on a substrate from the energized precursor gas. [0003] When the precursor gas is energized, an RF current return path is formed in the processing chamber. RF current travels from the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/32H01L21/205
CPCC23C16/4585H01J37/32449H01J37/32532H01J37/32577H01L21/68742C23C16/4586C23C16/505H01J37/32651H01J37/32715H01J37/32467H01J2237/3321H01L21/68785H05K9/002
Inventor 崔弈罗宾·L·蒂纳朴范秀崔寿永栗田真一
Owner APPLIED MATERIALS INC