A DMD multi-region laser projection system and exposure method
A technology of laser projection and exposure method, which is applied in the direction of microlithography exposure equipment, photolithography exposure device, optics, etc., can solve the problems of expensive DMD, long exposure time, and increased DMD cost, so as to expand the imaging area and improve Exposure to the overall time, the effect of saving material costs
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[0020] In order to make the object, technical solution and advantages of the present invention clearer, the present invention is described below through specific embodiments shown in the accompanying drawings. It should be understood, however, that these descriptions are exemplary only and are not intended to limit the scope of the present invention. Also, in the following description, descriptions of well-known structures and techniques are omitted to avoid unnecessarily obscuring the concept of the present invention.
[0021] Such as Figure 1-4 Shown, a kind of DMD multi-area laser projection system and exposure method of the present invention include DMD control system 1, optical system 2, mask plate 3, sub-map system 4 and motion control system 5, DMD control system 1 is responsible for data The processing CPU control unit and DMD control circuit are composed. The CPU control unit obtains the image data of the DMD control system 1, and after data conversion, sends the im...
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