Vacuum pipeline self-cleaning control system for continuous multi-station polishing machine

Abstract

A vacuum pipeline self-cleaning control system for a continuous multi-station polishing machine comprises a vacuum air storage tank, a pneumatic three-way ball valve I, a pressure force sensor I, a pneumatic three-way ball valve II, a pneumatic three-way ball valve III, a polishing disk I, a polishing disk II and a programmable controller. The vacuum air storage tank is connected with the pneumatic three-way ball valve I and the pressure force sensor I; the pneumatic three-way ball valve II and the pneumatic three-way ball valve III are arranged on a main vacuum pipeline connected with the vacuum air storage tank; the main vacuum pipeline is connected with the polishing disk I through a vacuum pipeline I provided with a pneumatic three-way ball valve IV and a pressure force sensor II and is connected with the polishing disk II through a vacuum pipeline II provided with a pneumatic three-way ball valve V and a pressure force sensor III; the programmable controller is connected with thepneumatic three-way ball valve III through an electromagnetic valve I and connected with the pneumatic three-way ball valve II through an electromagnetic valve II. By the vacuum pipeline self-cleaningcontrol system, whether the vacuum pipeline at each station is blocked or not can be judged, automatic vacuum pipeline cleaning is realized, and development of the multi-station polishing machine isbenefited.

Description

technical field [0001] The invention relates to a continuous multi-station polishing machine, in particular to a continuous multi-station polishing machine vacuum pipeline self-cleaning control system. Background technique [0002] The current polishing adsorption is all through the vacuum pump to generate negative pressure between the product and the carrier plate. During the polishing process, the polishing liquid passes through the vacuum pipeline, which is easy to cause pipeline blockage if used for a long time. Once the pipeline is blocked, it needs to be cleaned in time or Replacement, like this, not only causes material waste, and operation is also quite troublesome. In particular, the development trend of multi-station polishing machines makes the vacuum pipeline more and more complicated, which brings certain difficulties to the location of pipeline blockage. [0003] At present, for the complex vacuum pipeline of the continuous multi-station polishing machine, the...

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Problems solved by technology

[0002] The current polishing adsorption is all through the vacuum pump to generate negative pressure between the product and the carrier plate. During the polishing process, the polishing liquid passes through the vacuum pipeline, which is easy to cause pipeline blockage if used for a long time. Once the pipeline is blocked, it needs to be cleaned in time or Replacement, like this, not only causes waste of material, but also quite troublesome to operate

In particular, the development trend of multi-station polishing machines makes the vacuum pipeline more and more complicated, which brings certain difficulties to the location of pipeline blockage

[0003] At present, for the complex vacuum pipeline of the continuous multi-station polishing machine, there is no research and report on the control system that monitors the blockage of the vacuum pipeline and can automatically clean the vacuum pipeline.

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