Statistical process control method of zero excess particle number in ultra-clean room

A technology of statistical process control and particle number, applied in the direction of registration/indication of manufacturing process, registration/indication of quality control system, calculation, etc., can solve problems such as unsatisfactory effect, and achieve the effect of accurate parameter estimation

Active Publication Date: 2019-01-25
XIDIAN UNIV
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Problems solved by technology

Under this explanation, some zero-inflated models have been proposed, such as ZIP, ZINB and GZIP models, but in the monitoring of zero e

Method used

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  • Statistical process control method of zero excess particle number in ultra-clean room
  • Statistical process control method of zero excess particle number in ultra-clean room
  • Statistical process control method of zero excess particle number in ultra-clean room

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Comparison scheme
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Embodiment Construction

[0053] The present invention will be further described below by taking the number of particles collected in a clean room of an integrated circuit manufacturing company as an example in conjunction with the accompanying drawings.

[0054] refer to figure 1 , the implementation steps of this example are as follows:

[0055] Step 1: Collect a sample.

[0056] Using a Lasair II-100 particle counter, in a clean room with a cleanliness of 100, the number of particles with a particle diameter greater than 0.5um is collected, and the data is collected once per minute. After collecting 250 samples continuously, 90 zero data are obtained, and the sample data are shown in Table 1.

[0057] Table 1 Sample data with zero excess particle count

[0058]

[0059]

[0060] Step 2: Obtain the sample data according to step (1), and obtain the sample probability p with the number of particles m m and the sample probability mean

[0061] 2a) Perform statistics on the sample data in Ta...

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Abstract

The invention discloses a statistical process control method for zero excess particle number in ultra-clean room, which mainly solves the problem that the existing statistical process control technology misalarms too much or fails to alert in time when the zero proportion of particles in the super-clean room is greater than 50%. The method comprises the following steps: 1, collecting the particlenumber in the air by using the particle number counter, and the collected data including at least 90 non-zero data; 2, obtaining the probability of different particle numbers; 3, using the iterative method, calculating the estimate values of the parameters c and T in the threshold Poisson distribution, and obtaining the upper control limit; 4, according to the drawing method of Shewhart control chart, drawing the particle number and the control line into the corresponding control chart; 6. Judging whether the particle number in the super-clean room is controlled or not by observing whether thecontrol chart is slightly beyond the upper control line, and whether the production is really continued, so as to realize the timely early warning when the particle number is out of control, improvethe product quality, reduce the economic loss caused by the runaway, and can be used for the quality monitoring of the semiconductor production.

Description

technical field [0001] The invention belongs to the technical field of semiconductors, and in particular relates to a statistical process control method, which can be used to monitor whether the number of particles in a clean room is in a controlled state when there are too many zeros. Background technique [0002] "Statistical Process Control" is one of the most popular and effective quality improvement methods today. Statistical process control technology mainly refers to the use of Shewhart's process control theory, that is, the control chart to monitor the various stages of the product in the production process, that is, the quality characteristics of the process, and analyze the trend of the quality characteristics according to the point distribution on the control chart. Preventive measures to ensure that the production process is in a state of statistical control, so as to achieve the purpose of improving and ensuring quality. [0003] In semiconductor manufacturing,...

Claims

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Application Information

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IPC IPC(8): G06Q10/06G07C3/00G07C3/14G06Q50/04
CPCG06Q10/06395G06Q50/04G07C3/005G07C3/146Y02P90/30
Inventor 游海龙张金力田文星贾新章顾铠
Owner XIDIAN UNIV
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