ICP (inductively coupled plasma) linear heating device
A heating device and plasma technology, which is applied in the field of heating devices, can solve the problems of plasma torch head explosion, deviation, and inability to accurately pass through the flame center, so as to improve the collection rate of fine powder and improve the quality of finished products
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[0024] The present invention will be described in further detail below through examples, and the following examples are explanations of the present invention and the present invention is not limited to the following examples.
[0025] In the present invention, ICP refers to inductively coupled plasma, English Inductively Coupled Plasma, abbreviated as ICP, which is a plasma source that generates current as an energy source through electromagnetic induction of a magnetic field that changes with time.
[0026] Such as figure 1 As shown, a kind of ICP plasma linear heating device of the present invention comprises a wire feeding device, an annular support 1 and a plasma torch head 2, the annular support 1 is fixedly arranged, the wire feeding device is arranged above the annular support 1, and the plasma torch head 2 is arranged On the lower side of the ring support 1 and directly below the wire feeding device, the plasma torch head 2 is arranged vertically and the upper end of t...
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