A kind of power device packaging structure and its preparation method
A packaging structure and power device technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electric solid-state devices, etc., to achieve the effects of improving thermal conductivity, sealing performance, moisture-proof performance, and excellent heat dissipation performance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0031] The present invention also proposes a method for preparing the above power device packaging structure, comprising the following steps:
[0032] 1) A metal substrate is provided, and a first annular concave hole is formed on the peripheral edge of the lower surface of the metal substrate. The material of the metal substrate is one of aluminum, copper and stainless steel, and is etched by wet etching or dry method. Etching to form the first annular concave hole, the depth of the first annular concave hole is 0.5-1 mm, to improve the bonding tightness between the subsequently formed second thermally conductive sealant layer and the metal substrate, thereby improving the overall power device package The sealing performance and moisture-proof performance of the structure;
[0033] 2) bonding a heat-conducting silica gel layer on the upper surface of the metal base to improve the heat conduction performance and shock resistance of the entire power device packaging structure; ...
Embodiment 1
[0044] The present invention proposes a method for preparing a package structure of a power device, comprising the following steps:
[0045] 1) A metal base is provided, and a first annular concave hole is formed on the peripheral edge of the lower surface of the metal base. The material of the metal substrate is aluminum, and the first annular concave hole is formed by wet etching, and the the depth of the first annular recess is 0.8 mm;
[0046] 2) bonding a heat-conducting silica gel layer on the upper surface of the metal base;
[0047] 3) Depositing an insulating material on the thermally conductive silica gel layer to form an insulating layer, depositing silicon nitride by PECVD to form the insulating layer, and the thickness of the insulating layer is 90 microns;
[0048] 4) forming a circuit wiring layer on the insulating layer, the specific steps are: bonding copper foil on the insulating layer, and removing part of the copper foil through an etching process to form ...
Embodiment 2
[0057] The present invention also proposes a method for preparing the above power device packaging structure, comprising the following steps:
[0058] 1) A metal base is provided, and a first annular concave hole is formed on the peripheral edge of the lower surface of the metal base. The material of the metal substrate is copper, and the first annular concave hole is formed by dry etching, and the the depth of the first annular recess is 1 mm;
[0059] 2) bonding a heat-conducting silica gel layer on the upper surface of the metal base;
[0060] 3) Depositing an insulating material on the thermally conductive silica gel layer to form an insulating layer, depositing silicon carbide by PECVD to form the insulating layer, the thickness of the insulating layer is 120 microns;
[0061] 4) forming a circuit wiring layer on the insulating layer, the specific steps are: bonding copper foil on the insulating layer, and removing part of the copper foil through an etching process to fo...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 

