Active switch, manufacture method thereof, and display device

Abstract

The invention relates to an active switch, a manufacture method thereof, and a display device. The manufacture method for the active switch comprises the following steps that: providing a substrate, and forming a grid electrode on the substrate; forming a grid electrode insulation layer, an active membrane layer, a doped membrane layer and a second metal layer on the grid electrode in sequence; adopting a first-time wet method etching technology to etch the second metal layer to form a second sub-metal layer, wherein the etching time of the second metal layer is 55-75 seconds; adopting a first-time dry method etching technology to etch the active membrane layer and the doped membrane layer to form an active layer and a doping layer, and meanwhile, carrying out ashing on photoresist; adopting a second wet method etching technology to etch the second sub-metal layer to form a source and drain electrode; and adopting a second dry method etching technology to etch the active layer and thedoped layer to form a channel region. By use of the manufacture method, the light leakage current of an active switch device can be effectively lowered, and a ghost phenomenon is eliminated.

Description

technical field [0001] The present application relates to the field of display technology, in particular to an active switch, a manufacturing method thereof, and a display device. Background technique [0002] As a switching device that plays a very important role in the working performance of the display panel, it is a very important key device in the display technology. With the iterative development of display technology, display devices with higher performance, high image quality and large size have become a development trend, and are also factors that directly affect user viewing experience and shopping experience. In terms of high performance, if a display device is to have higher performance, one aspect requires high-performance switching devices in the display device. [0003] In the general switching device manufacturing process, it can be divided into 5-mask process and 4-mask process. Compared with the 5-mask process, the 4-mask process reduces the photolithograp...

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Problems solved by technology

[0004] Based on this, it is necessary to provide an active switch, a manufacturing method thereof, and a display device for the problem that a switching device made by using a 4-mask process has a large Tail (tail), which leads to an increase in light leakage current.

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