A continuous double sample chamber plasma cleaning device
A plasma and cleaning device technology, which is applied in the direction of cleaning methods and appliances, chemical instruments and methods, etc., can solve the problems of plasma uniformity limitation, large volume of plasma cleaning chamber, and increased equipment cost, so as to improve cleaning stability , Improve cleaning efficiency, simple structure
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[0015] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.
[0016] refer to figure 1 , a continuous double-sample chamber plasma cleaning device, comprising a plasma cleaning chamber 6, a sample chamber 3 is arranged on both sides of the plasma cleaning chamber 6, and the sample chamber 3 communicates with the plasma cleaning chamber 6 through a connecting channel 7, The sample room 3 is provided with a sample storehouse, and the sample storehouse is provided with a multi-layer sample holder 4, and the top of the sample room 3 is fixed with a sample storehouse lifting device 2, and the lifting output end of the sample storehouse lifting device 2 is fixedly connected to the sample storehouse The side of the sample chamber 3 aw...
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