A continuous double sample chamber plasma cleaning device

A plasma and cleaning device technology, which is applied in the direction of cleaning methods and appliances, chemical instruments and methods, etc., can solve the problems of plasma uniformity limitation, large volume of plasma cleaning chamber, and increased equipment cost, so as to improve cleaning stability , Improve cleaning efficiency, simple structure

Active Publication Date: 2021-05-18
WUHAN PUDI VACUUM TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] 1. The volume of the plasma cleaning chamber is large, and the overall discharge area is large, resulting in the need for a high-power power supply, which greatly increases the cost of equipment;
[0004] 2. Due to the multi-layer structure, the internal airflow distribution and electric field distribution are affected, and the uniformity of the final plasma is limited, resulting in the instability of the cleaning effect

Method used

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  • A continuous double sample chamber plasma cleaning device

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Embodiment Construction

[0015] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.

[0016] refer to figure 1 , a continuous double-sample chamber plasma cleaning device, comprising a plasma cleaning chamber 6, a sample chamber 3 is arranged on both sides of the plasma cleaning chamber 6, and the sample chamber 3 communicates with the plasma cleaning chamber 6 through a connecting channel 7, The sample room 3 is provided with a sample storehouse, and the sample storehouse is provided with a multi-layer sample holder 4, and the top of the sample room 3 is fixed with a sample storehouse lifting device 2, and the lifting output end of the sample storehouse lifting device 2 is fixedly connected to the sample storehouse The side of the sample chamber 3 aw...

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Abstract

The invention relates to the technical field of plasma cleaning equipment, in particular to a continuous double-sample chamber plasma cleaning device, which includes a plasma cleaning chamber, sample chambers are arranged on both sides of the plasma cleaning chamber, and a sample library is arranged in the sample chamber. There are multi-layer sample holders in the warehouse. The sample warehouse lifting device is fixed above the sample chamber. The lifting output end of the sample warehouse lifting device is fixedly connected to the sample warehouse. There is a sample delivery device, and the plasma cleaning chamber, sample delivery device and sample library lifting device are fully automatic controlled. The invention can effectively reduce the size of the cleaning chamber, ensure the uniformity of the plasma discharge, obtain the best cleaning effect, fully automatic control, and avoid the change of the atmosphere of the cleaning chamber caused by continuous opening of the cleaning chamber, thereby causing inconsistency in the cleaning effect.

Description

technical field [0001] The invention relates to the technical field of plasma cleaning equipment, in particular to a continuous double-sample chamber plasma cleaning device. Background technique [0002] Plasma cleaning device (plasma cleaner), also called plasma cleaning machine, or plasma surface treatment instrument, is a brand-new high-tech technology that uses plasma to achieve effects that cannot be achieved by conventional cleaning methods. Plasma is a state of matter, also known as the fourth state of matter, which does not belong to the common three states of solid, liquid, and gas. When enough energy is applied to the gas to ionize it, it becomes a plasma state. The "active" components of the plasma include: ions, electrons, atoms, active groups, nuclides in excited states (metastable states), photons, etc. The plasma cleaner is to use the properties of these active components to treat the surface of the sample, so as to achieve the purpose of cleaning and coatin...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B7/00B08B13/00
CPCB08B7/00B08B13/00
Inventor 周焱文
Owner WUHAN PUDI VACUUM TECH CO LTD
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