Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Connection survey system and method

A measurement system and measurement method technology, applied in measurement devices, measurement instruments, height/level measurement, etc., can solve the problems of measurement deviation, wind resistance, earthquake resistance, measurement error, etc., to avoid measurement and avoid measurement deviation. , the effect of reducing the measurement error

Active Publication Date: 2019-04-26
中铁大桥局第七工程有限公司
View PDF7 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The technical problem to be solved by the present invention is that the existing contact measurement method has poor wind resistance and earthquake resistance, which leads to measurement deviation, and the influence of lateral refraction cannot be found, and there is a problem of measurement error

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Connection survey system and method
  • Connection survey system and method
  • Connection survey system and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] The invention provides a contact measurement system and a measurement method. The accuracy of the measurement method is not affected by the processing error of the instrument accessories, the measurement is not affected by the air disturbance, the measurement deviation is avoided, and the light spots caused by the difference of the two-color refractive index can be used. Do not overlap to check whether there is atmospheric refraction in the projected light, so as to avoid measurement at inappropriate time and reduce measurement error. The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0042] Such as Figure 1 to Figure 8 As shown, a contact measurement system and measurement method provided by the present invention include two Z-shaped tripods 7, a reflection box 515, a glass sheet 10 and a connection structure.

[0043] Such as figure 1 figure 2 with Figure 5 As shown, two Z-shaped tri...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a connection survey system and method. The survey system comprises two Z-type tripods, reflecting boxes and glass sheets; the Z-type tripods are arranged at the top of a to-be-surveyed vertical pit and provided with a vertical line laser alignment instrument and a total station respectively, and the vertical line laser alignment instrument emits lasers with two colors; thetwo reflecting boxes are arranged at the bottom of the to-be-surveyed vertical pit; the glass sheets are arranged between one Z-type tripod and the vertical line laser alignment instrument as well asbetween the corresponding Z-type tripod and the total station. Through mercury layers in the reflecting boxes, an absolute horizontal plane is provided; through the total station and the lasers with two colors emitted by the vertical line laser alignment instrument, two gravity lines perpendicular to the mercury layers are obtained, in this way, a ground traverse point is introduced into the bottom of the pit, survey deviation is avoided, through the fact that light spots do not overlap since two-color refractive indexes are different, whether or not projecting light rays have atmospheric refraction is detected, accordingly, it is avoided that survey is conducted at in appropriate time, and survey errors are reduced.

Description

technical field [0001] The invention relates to the technical field of contact measurement, in particular to a contact measurement system and a measurement method. Background technique [0002] In the construction process of underground projects such as tunnels and mines, in order to ensure that the construction is excavated according to the design direction and that the working faces excavated in all directions can be correctly penetrated at the predetermined location, the plane coordinate system and elevation coordinate system of the ground must be passed through the inclined shaft or vertical shaft. Transferred to the subsurface, these transfer jobs are called contact surveys. [0003] The underground and surface surveys have a unified plane coordinate system and elevation system through contact surveys, and at the same time provide coordinates, azimuth angles and elevation initial calculation data for underground surveys. Therefore, it is of great practical significance...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01C15/00G01C5/00
CPCG01C5/00G01C15/002
Inventor 韩国卿杜操张友光李施展汤伟严泽红赵荣段绪龙楚晓栗亮李浩然黄建军
Owner 中铁大桥局第七工程有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com