Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

X-ray fluorescence spectrometer

An X-ray and photometer technology, applied in the field of X-ray fluorescence XRF photometer, can solve the problems of unfavorable radiation measurement

Pending Publication Date: 2019-05-14
布鲁克纳米有限责任公司
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This is particularly disadvantageous when performing radiometric measurements on samples with higher topography, such as on printed circuit boards (PCBs) with multiple surface mount components of different heights

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • X-ray fluorescence spectrometer
  • X-ray fluorescence spectrometer
  • X-ray fluorescence spectrometer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0046] Reference will now be made in detail to the embodiments, examples of which are illustrated in the accompanying drawings. The effects and features of the exemplary embodiments and their implementation methods will be described with reference to the accompanying drawings. In the drawings, the same reference numerals designate the same elements, and redundant descriptions are omitted. However, this invention may be embodied in various different forms and should not be construed as limited to only the embodiments set forth herein. Rather, these embodiments are provided as examples so that this disclosure will be thorough and complete, and will fully convey the aspects and features of the invention to those skilled in the art.

[0047] Accordingly, procedures, elements and techniques that were not deemed necessary to enable one of ordinary skill in the art to gain a complete understanding of the aspects and features of the invention may not have been described.

[0048] As...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to an X-ray fluorescence, XRF, spectrometer (10), for measuring X-ray fluorescence emitted by a target (7), wherein the XRF spectrometer (10) comprises an X-ray tube (1)with an anode (2) that is emitting a divergent X-ray beam (3a), a capillary lens (6) that is configured to focus the divergent X-ray beam (3a) on the target (7), an aperture system (4) that is positioned between the anode (2) of the X-ray tube (1) and the capillary lens (6) and comprises at least one pinhole (9a, 9b), and a detector (8) that is configured for detecting X-ray fluorescence radiationemitted by the target (7), wherein the at least one pinhole (9a, 9b) is configured for being inserted into the divergent X-ray beam (3a) and for reducing a beam cross section (5a) of the divergent X-ray beam (3a) between the anode (2) and the capillary lens (6). The present invention further relates to an aperture system (4) for a spectrometer (10), to the use of an aperture system (4) for adjusting the focal depth of a spectrometer (10) and to a method for adjusting the focal depth of the spectrometer (10).

Description

technical field [0001] The present invention relates to X-ray fluorescence XRF spectrometers, preferably micro XRF spectrometers with polycapillary X-ray optics, and to aperture systems for such XRF spectrometers. The invention also relates to a method for setting the depth of focus of an X-ray fluorescence photometer and to the use of an aperture system according to the invention for setting the depth of focus of an XRF photometer. Background technique [0002] X-ray Fluorescence Photometry XRF is widely used in scientific and commercial applications for the non-destructive investigation of material composition. Therein the object to be investigated is exposed to an incident beam of short-wavelength X-rays which is opposite to the incident beam of electrons in the energy dispersive X-ray photometer EDX. In response to the incident beam, the target emits element-specific fluorescent radiation that can be used to analyze the elemental composition of the target. [0003] Oft...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01N23/223
CPCA61B6/06A61B6/485A61B6/54G01N2223/076G01N2223/204G01N2223/316G01N2223/3301G01N2223/6113G21K1/04G21K1/067G01N23/223
Inventor U.瓦尔德施莱格R.A.塔格莱贝尔丹
Owner 布鲁克纳米有限责任公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com